DIAMOND FILM GROWTH WITH MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION (MPCVD)

Abstract

The growth of large area nanocrystalline diamond (NCD) film is of industrial interests because of their potential applications as hard mask. Here, we proposed “dry-seeding” methods to produce diamond grains for subsequent NCD film deposition on wafer-scaled silicon substrate. Owing to the formation of high crystalline diamond grains by “dry-seeding” method, the photochemically induced poly-adamantane, which served as a low-cost and high-density seeding layer, greatly reduced the film residual stress The NCD film grown by another “dry-seeding” method (Bias enhanced nucleation) exhibited ideal optical properties and rendered dynamic structural colors when a periodic array of asymmetric diamond cuboids with high-aspect ratio of ~3.1 was patterned on its surface. Our work demonstrates that the “dry-seeding” method combined with linear antenna MPCVD system can be potentially used for in-line deposition of NCD film mask and growth of high-quality NCD film.