Please use this identifier to cite or link to this item: https://doi.org/10.3390/coatings10060586
Title: Investigation of electrochemical oxidation behaviors and mechanism of single-crystal silicon (100) wafer under potentiostatic mode
Authors: Guo, W.
Anantharajan, S.K.
Liu, K. 
Deng, H.
Keywords: Electrochemical oxidation
Oxidation behaviour
Potentiostatic mode
Silicon
Issue Date: 2020
Publisher: MDPI AG
Citation: Guo, W., Anantharajan, S.K., Liu, K., Deng, H. (2020). Investigation of electrochemical oxidation behaviors and mechanism of single-crystal silicon (100) wafer under potentiostatic mode. Coatings 10 (6) : Jan-14. ScholarBank@NUS Repository. https://doi.org/10.3390/coatings10060586
Rights: Attribution 4.0 International
Abstract: Electrochemical oxidation (ECO) has been used widely to oxidize single crystal Si wafers. Aiming at optimizing the ECO assisted machining methods, the oxidation behaviors of single-crystal silicon (100) wafer under potentiostatic mode are experimentally investigated. It is shown that the Si wafer can be electrochemically oxidized and the oxidized film thickness reaches to 239.6 nanometers in 20 min. The hardness of the oxidized surface is reduced by more than 50 percent of the original surface. The results indicate that the oxide thickness and the hardness can be controlled by changing the voltage. Based on the experimental findings, a hypothesis on the ECO mechanism under potentiostatic mode was proposed to explain the fluctuations of current density under specific applied voltage. The occurrence of the multiple peaks in the current density curve during the oxidation process is due to the formation of discharge channels, which was initiated from the defects at the interface between the oxide bottom and the substrate. This breaks the electrical isolation and leads to the discontinuous growth of the electrochemical oxide layer. The present work contributes to the fundamental understanding of the ECO behaviors for the single-crystal Si (100) wafer under potentiostatic mode. � 2020 by the authors. Licensee MDPI, Basel, Switzerland.
Source Title: Coatings
URI: https://scholarbank.nus.edu.sg/handle/10635/197726
ISSN: 20796412
DOI: 10.3390/coatings10060586
Rights: Attribution 4.0 International
Appears in Collections:Elements
Staff Publications

Show full item record
Files in This Item:
File Description SizeFormatAccess SettingsVersion 
10_3390_coatings10060586.pdf2.58 MBAdobe PDF

OPEN

NoneView/Download

SCOPUSTM   
Citations

1
checked on Jun 29, 2022

Page view(s)

80
checked on Jun 23, 2022

Google ScholarTM

Check

Altmetric


This item is licensed under a Creative Commons License Creative Commons