Trimming-Less 0.2-V, 3.2-pW Voltage Reference Based on Corner-Aware Replica Combination with 1.6% Process Sensitivity, 1.4-mV Accuracy across PVT and Wafers

Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/192143

Title:	Trimming-Less 0.2-V, 3.2-pW Voltage Reference Based on Corner-Aware Replica Combination with 1.6% Process Sensitivity, 1.4-mV Accuracy across PVT and Wafers
Authors:	Fassio, Luigi De Rose, Raffaele Longyang Lin Lanuzza, Marco Crupi, Felice Alioto, Massimo Bruno
Issue Date:	2-Jun-2021
Publisher:	IEEE
Citation:	Fassio, Luigi, De Rose, Raffaele, Longyang Lin, Lanuzza, Marco, Crupi, Felice, Alioto, Massimo Bruno (2021-06-02). Trimming-Less 0.2-V, 3.2-pW Voltage Reference Based on Corner-Aware Replica Combination with 1.6% Process Sensitivity, 1.4-mV Accuracy across PVT and Wafers. IEEE ESSCIRC 2021. ScholarBank@NUS Repository.
Abstract:	This work introduces a class of voltage references able to operate down to 3.2 pW and 0.2-V supply for energy harvesting with relaxed or suppressed voltage regulation (direct harvesting). Inherent wafer-to-wafer process sensitivity limitations and effect of process corners in deep sub-threshold are mitigated via a selection/combination of circuit replicas driven by a process sensor, at zero testing effort and trimming. A 180-nm testchip shows 1.6% process sensitivity (including wafer-to-wafer variations), 60.7-µV/V line sensitivity, and 34.9-µV/oC temperature coefficient, leading to 1.4-mV overall accuracy across corner wafers.
Source Title:	IEEE ESSCIRC 2021
URI:	https://scholarbank.nus.edu.sg/handle/10635/192143
Appears in Collections:	Elements Staff Publications

File	Description	Size	Format	Access Settings	Version
A 3.2-pW, 0.2-V Trimming-Less Voltage Reference with 1.4-mV Across-Wafer Total Accuracy.pdf	Accepted version	903.91 kB	Adobe PDF	OPEN	Post-print	View/Download

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