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Title: Considerations for the nano aperture ion source: Geometrical design and electrical control
Authors: Jeroen A. van Kan 
Rudy Pang 
Tanmoy Basu 
Yanxin Dou 
Nicolas Tarino
Jack Tregidga
Sangita Chaki Roy 
Huei Ming Tan 
Keywords: Lenses
Focused ion beam
Chemical vapor deposition
Electronic control systems
Physics of gases
Tensile stress
Ion sources
Optical aberrations
Electron beams
Issue Date: 10-Jan-2020
Publisher: AIP Publishing
Citation: Jeroen A. van Kan, Rudy Pang, Tanmoy Basu, Yanxin Dou, Gokul, Nicolas Tarino, Jack Tregidga, Sangita Chaki Roy, Huei Ming Tan (2020-01-10). Considerations for the nano aperture ion source: Geometrical design and electrical control. Review of Scientific Instruments 91 (1). ScholarBank@NUS Repository.
Abstract: A new type of ion source is being developed for proton beam writing and other focused ion beam applications. The potential of this source as well as achieved performance of the nano aperture ion source will be evaluated. Based on the ideal source parameters, critical geometrical parameters constraining chromatic aberrations and a possible pathway to achieve this performance will be presented. Finally, an electronic control system to minimize chromatic and spherical aberrations to an acceptable level will be demonstrated.
Source Title: Review of Scientific Instruments
ISSN: 10897623
DOI: 10.1063/1.5128657
Appears in Collections:Staff Publications

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