Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/155058
Title: Silicon surface passivation by aluminium oxide studied with electron energy loss spectroscopy
Authors: Hoex, Bram 
Bosman, Michel 
Nandakumar, Naomi 
Kessels, WMM
Keywords: Science & Technology
Technology
Physical Sciences
Materials Science, Multidisciplinary
Physics, Applied
Physics, Condensed Matter
Materials Science
Physics
surface passivation
Al2O3
electron energy loss spectroscopy
silicon
wafers
solar cells
CHEMICAL-VAPOR-DEPOSITION
ATOMIC-LAYER-DEPOSITION
ALD AL2O3
SI
RECOMBINATION
Issue Date: 1-Nov-2013
Publisher: WILEY-V C H VERLAG GMBH
Citation: Hoex, Bram, Bosman, Michel, Nandakumar, Naomi, Kessels, WMM (2013-11-01). Silicon surface passivation by aluminium oxide studied with electron energy loss spectroscopy. PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS 7 (11) : 937-941. ScholarBank@NUS Repository.
Abstract: The origin behind crystalline silicon surface passivation by Al2O3films is studied in detail by means of spatially-resolved electron energy loss spectroscopy. The bonding configurations of Al and O are studied in as-deposited and annealed Al2O3films grown on c-Si substrates by plasma-assisted and thermal atomic layer deposition. The results confirm the presence of an interfacial SiO2-like film and demonstrate changes in the ratio between tetrahedrally and octahedrally coordinated Al in the films after annealing. These observations reveal the underlying origin of c-Si surface passivation by Al2O3. (© 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim) The origin behind crystalline silicon surface passivation by Al2O3films is studied in detail by means of spatially-resolved electron energy loss spectroscopy. The results confirm the presence of an interfacial SiO2-like film and demonstrate changes in the ratio between tetrahedrally and octahedrally coordinated Al in the films after annealing. These observations reveal the underlying origin of c-Si surface passivation by Al2O3. © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Source Title: PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS
URI: https://scholarbank.nus.edu.sg/handle/10635/155058
ISSN: 1862-6254
1862-6270
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