Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/153963
Title: IMPROVEMENT OF OPTICAL CONTROL MONITOR TO RECTIFY TUNGSTEN PARTICLE PEEL-OFF ISSUE
Authors: GUO WEIMIN
Keywords: OCM modification
tungsten peel-off
overlay
alignment
CMP
contamination
carbon
slurry
Issue Date: 2008
Citation: GUO WEIMIN (2008). IMPROVEMENT OF OPTICAL CONTROL MONITOR TO RECTIFY TUNGSTEN PARTICLE PEEL-OFF ISSUE. ScholarBank@NUS Repository.
Abstract: Optical Control Monitor (OCM) structures are features along the scribe lines of wafers, which are required for a variety of functions. The designs of some of these structures have resulted in a tungsten particle peel-off issue, which is detrimental to wafer yield. This project attempts to rectify this issue by removing or redesigning potentially problematic OCM structures. Besides discussing the temporary measures currently in place to contain these issues, the various changes to be made to the overlay and non-overlay structures are introduced and explained. Finally, experimental procedures to verify the effectiveness of the OCM changes and to determine the optimal overlay specifications are proposed.
URI: https://scholarbank.nus.edu.sg/handle/10635/153963
Appears in Collections:Master's Theses (Restricted)

Show full item record
Files in This Item:
File Description SizeFormatAccess SettingsVersion 
Guo Weimin_SMA Dissertation (Guo Weimin).pdf1.36 MBAdobe PDF

RESTRICTED

NoneLog In

Page view(s)

4
checked on Jul 10, 2020

Download(s)

1
checked on Jul 10, 2020

Google ScholarTM

Check


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.