Please use this identifier to cite or link to this item: https://doi.org/10.1007/s13391-012-1107-1
Title: The effect of pressure and growth temperature on the characteristics of polycrystalline In 2Se 3 films in metal organic chemical vapor deposition
Authors: Yu, S.M.
Yoo, J.H.
Patole, S.P.
Lee, J.H. 
Yoo, J.-B.
Keywords: buffer layer
In 2Se 3
metal organic chemical vapor deposition
scanning electron microscopy
thin solid films
Issue Date: Jun-2012
Citation: Yu, S.M., Yoo, J.H., Patole, S.P., Lee, J.H., Yoo, J.-B. (2012-06). The effect of pressure and growth temperature on the characteristics of polycrystalline In 2Se 3 films in metal organic chemical vapor deposition. Electronic Materials Letters 8 (3) : 245-250. ScholarBank@NUS Repository. https://doi.org/10.1007/s13391-012-1107-1
Abstract: This study examined the effect of the growth parameters on the characteristics of polycrystalline In 2Se 3 (IS) films using metal organic chemical vapor deposition. Trimethylindium and ditertiarybutylselenide metal organic compounds were used as the indium and selenium sources to deposit the IS films on soda lime glass. The effect of the growth pressure was examined from 10 to 80 torr. The effect of the growth temperature was studied in the range, 300°C to 500°C. Scanning electron microscopy and high resolution x-ray diffraction was used to analyze the morphological and structural properties of the deposited films. Optical absorption was used to examine the optical properties and band gap of the deposited IS films. The details of the analysis are presented. © 2012 The Korean Institute of Metals and Materials and Springer Netherlands.
Source Title: Electronic Materials Letters
URI: http://scholarbank.nus.edu.sg/handle/10635/125037
ISSN: 17388090
DOI: 10.1007/s13391-012-1107-1
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

SCOPUSTM   
Citations

6
checked on Oct 15, 2020

WEB OF SCIENCETM
Citations

5
checked on Oct 15, 2020

Page view(s)

30
checked on Oct 17, 2020

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.