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Han Yang,Saxena

rp06867

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Full Name
Han Yang,Saxena
Variants
Srinivasan Madapusi P.
Madapusi, S.
Srinivasan Malapusi P.
Srinivasan Madapusi
Srinivasan, M.P
Srinivasan, P.
Srinivasan, Madapusi P.
Srinivasan M.P.
Srinivasan, M.P.
Srinivasan, M.
 
Main Affiliation
 
Faculty
 

Publications

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Department:  CHEMICAL & BIOMOLECULAR ENGINEERING
Date Issued:  [2000 TO 2009]

Results 1-20 of 68 (Search time: 0.005 seconds).

Issue DateTitleAuthor(s)
12-Jan-2008A- and B-site substituted lanthanum cobaltite perovskite as high temperature oxygen sorbent. 1. thermogravimetric analysis of equilibrium and kineticsGuntuka, S.; Banerjee, S. ; Farooq, S. ; Srinivasan, M.P. 
2Jan-2004Analytical damage tables for crystalline siliconChan, H.Y.; Benistant, F.; Srinivasan, M.P. ; Erlebach, A.; Zechner, C.
32005Angled XPS analysis of low-k dielectric surfaces after cleaningTan, Y.S.; Chooi, S.Y.M.; Sin, C.-Y.; Ee, P.-Y.; Srinivasan, M.P. ; Pehkonen, S.O. 
412-Apr-2005Application of direct covalent molecular assembly in the fabrication of polyimide ultrathin filmsZhang, F. ; Jia, Z.; Srinivasan, M.P. 
5Jan-2006Application of molecular dynamics for low-energy ion implantation in crystalline siliconChan, H.Y.; Srinivasan, M.P. ; Montgomery, N.J.; Mulcahy, C.P.A.; Biswas, S.; Gossmann, H.-J.L.; Harris, M.; Nordlund, K.; Benistant, F.; Ng, C.M.; Gui, D.; Chan, L.
65-Dec-2005Bimodal distribution of damage morphology generated by ion implantationMok, K.R.C.; Jaraiz, M.; Martin-Bragado, I.; Rubio, J.E.; Castrillo, P.; Pinacho, R.; Srinivasan, M.P. ; Benistant, F.
7Sep-2004Characterization of low-k dielectric trench surface cleaning after a fluorocarbon etchTan, Y.S.; Chooi, S.Y.M. ; Sin, C.-Y.; Ee, P.-Y.; Srinivasan, M.P. ; Pehkonen, S.O. 
82008Comprehensive model of damage accumulation in siliconMok, K.R.C.; Benistant, F.; Jaraiz, M.; Rubio, J.E.; Castrillo, P.; Pinacho, R.; Srinivasan, M.P. 
95-Dec-2005Comprehensive modeling of ion-implant amorphization in siliconMok, K.R.C.; Jaraiz, M.; Martin-Bragado, I.; Rubio, J.E.; Castrillo, P.; Pinacho, R.; Srinivasan, M.P. ; Benistant, F.
1010-May-2006Continuum modeling of post-implantation damage and the effective plus factor in crystalline silicon at room temperatureChan, H.Y.; Srinivasan, M.P. ; Benistant, F.; Mok, K.R.; Chan, L.; Jin, H.M.
1117-Jan-2007Covalent molecular assembly in a supercritical medium: Formation of nanoparticles encapsulated in immobilized dendrimersPuniredd, S.R.; Srinivasan, M.P. 
1225-Apr-2006Covalent molecular assembly in supercritical carbon dioxide: A comparative study between amine- And anhydride-derivatized surfacesPuniredd, S.R.; Srinivasan, M.P. 
1315-May-2009Covalent molecular assembly in supercritical carbon dioxide: Formation of nanoparticles in immobilized dendrimers within a porous silica gel matrixPuniredd, S.R.; Nguan, B.C.C.; Srinivasan, M.P. 
142008Covalent molecular assembly of conducting polymers on siliconJayaraman, S.; Srinivasan, M.P. 
151-Feb-2007Covalent molecular assembly of multilayer dendrimer ultrathin films in supercritical mediumPuniredd, S.R.; Srinivasan, M.P. 
1616-Aug-2005Covalent molecular assembly of oligoimide ultrathin films in supercritical and liquid solvent mediaPuniredd, S.R.; Srinivasan, M.P. 
1723-May-2005Cross-linked polyimide - Polythiophene composite films with reduced surface resistivitiesZhang, F.; Srinivasan, M.P. 
182007Defect engineering by surface chemical state in boron-doped preamorphized siliconYeong, S.H.; Srinivasan, M.P. ; Colombeau, B.; Chan, L.; Akkipeddi, R.; Kwok, C.T.M.; Vaidyanathan, R.; Seebauer, E.G.
192008Defect engineering for ultrashallow junctions using surfacesSeebauer, E.G.; Kwok, C.T.M.; Vaidyanathan, R.; Kondratenko, Y.V.; Yeong, S.H.; Srinivasan, M.P. ; Colombeau, B.; Chan, L.
202007Defect engineering for ultrashallow junctions using surfacesSeebauer, E.G.; Yeong, S.H.; Srinivasan, M.P. ; Kwok, C.T.M.; Vaidyanathan, R.; Colombeau, B.; Chan, L.