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Han Yang,Saxena

rp06867

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Full Name
Han Yang,Saxena
Variants
Srinivasan Madapusi P.
Madapusi, S.
Srinivasan Malapusi P.
Srinivasan Madapusi
Srinivasan, M.P
Srinivasan, P.
Srinivasan, Madapusi P.
Srinivasan M.P.
Srinivasan, M.P.
Srinivasan, M.
 
Main Affiliation
 
Faculty
 

Publications

Refined By:
Date Issued:  [2000 TO 2023]
Type:  Conference Paper

Results 1-20 of 30 (Search time: 0.005 seconds).

Issue DateTitleAuthor(s)
12-Jan-2008A- and B-site substituted lanthanum cobaltite perovskite as high temperature oxygen sorbent. 1. thermogravimetric analysis of equilibrium and kineticsGuntuka, S.; Banerjee, S. ; Farooq, S. ; Srinivasan, M.P. 
2Jan-2004Analytical damage tables for crystalline siliconChan, H.Y.; Benistant, F.; Srinivasan, M.P. ; Erlebach, A.; Zechner, C.
32005Angled XPS analysis of low-k dielectric surfaces after cleaningTan, Y.S.; Chooi, S.Y.M.; Sin, C.-Y.; Ee, P.-Y.; Srinivasan, M.P. ; Pehkonen, S.O. 
45-Dec-2005Bimodal distribution of damage morphology generated by ion implantationMok, K.R.C.; Jaraiz, M.; Martin-Bragado, I.; Rubio, J.E.; Castrillo, P.; Pinacho, R.; Srinivasan, M.P. ; Benistant, F.
55-Dec-2005Comprehensive modeling of ion-implant amorphization in siliconMok, K.R.C.; Jaraiz, M.; Martin-Bragado, I.; Rubio, J.E.; Castrillo, P.; Pinacho, R.; Srinivasan, M.P. ; Benistant, F.
610-May-2006Continuum modeling of post-implantation damage and the effective plus factor in crystalline silicon at room temperatureChan, H.Y.; Srinivasan, M.P. ; Benistant, F.; Mok, K.R.; Chan, L.; Jin, H.M.
72008Covalent molecular assembly of conducting polymers on siliconJayaraman, S.; Srinivasan, M.P. 
82008Defect engineering for ultrashallow junctions using surfacesSeebauer, E.G.; Kwok, C.T.M.; Vaidyanathan, R.; Kondratenko, Y.V.; Yeong, S.H.; Srinivasan, M.P. ; Colombeau, B.; Chan, L.
92007Defect engineering for ultrashallow junctions using surfacesSeebauer, E.G.; Yeong, S.H.; Srinivasan, M.P. ; Kwok, C.T.M.; Vaidyanathan, R.; Colombeau, B.; Chan, L.
102013High density metal oxide (ZnO) nanopatterned platforms for electronic applicationsSuresh, V.; Huang, M.S.; Srinivasan, M.P. ; Krishnamoorthy, S.
1118-Feb-2002Imidisation of Langmuir-Blodgett films using a supercritical mediumSrinivasan, M.P ; Gu, Y.; Begum, R.
125-Dec-2005Ion-implant simulations: The effect of defect spatial correlation on damage accumulationMok, K.R.C.; Jaraiz, M.; Martin-Bragado, I.; Rubio, J.E.; Castrillo, P.; Pinacho, R.; Srinivasan, M.P. ; Benistant, F.
135-May-2005Langmuir-Blodgett film fabricated with dendrimer modified polyimideJia, Z.; Srinivasan, M.P. 
145-May-2005Langmuir-Blodgett film fabricated with soluble imidized polyimideJia, Z.; Tyng, G.S.; Ling, A.H.; Srinivasan, M.P. 
152006Modeling and simulation of the influence of SOI structure on damage evolution and ultra-shallow junction formed by Ge preamorphization implants and solid phase epitaxial regrowthMok, K.R.C.; Colombeau, B.; Jaraiz, M.; Castrillo, P.; Rubio, J.E.; Pinacho, R.; Srinivasan, M.P. ; Benistant, F.; Martin-Bragado, I.; Hamilton, J.J.
1610-May-2006Molecular dynamics with phase-shift-based electronic stopping for calibration of ion implantation profiles in crystalline siliconChan, H.Y.; Nordlund, K.; Gossmann, H.-J.L.; Harris, M.; Montgomery, N.J.; Mulcahy, C.P.A.; Biswas, S.; Srinivasan, M.P. ; Benistant, F.; Ng, C.M.; Chan, L.
172006Phosphorus implant for S/D extension formation: Diffusion and activation study after spacer and spike annealYeong, S.H.; Colombeau, B.; Benistant, F.; Srinivasan, M.P. ; Mulcahy, C.P.A.; Lee, P.S.; Chan, L.
182006Phosphorus implant for S/D extension formation: Diffusion and activation study after spacer and spike annealYeong, S.H.; Colombeau, B.; Benistant, F.; Srinivasan, M.P. ; Mulcahy, C.P.A.; Lee, P.S.; Chan, L.
192008Polythiophene-gold nanoparticle hybrid systems: Langmuir-blodgett assembly of nano-structured filmsJayaraman, S.; Liew, T.Y.; Gorai, P.; Srinivasan, M.P. 
202008Polythiophene-gold nanoparticle hybrid systems: Langmuir-blodgett assembly of nano-structured filmsJayaraman, S.; Liew, T.Y.; Gorai, P.; Srinivasan, M.P.