Please use this identifier to cite or link to this item:
|Title:||Plasma polymerization and deposition of linear, cyclic and aromatic fluorocarbons on (100)-oriented single crystal silicon substrates|
|Citation:||Yang, G.H., Oh, S.W., Kang, E.T., Neoh, K.G. (2002-11). Plasma polymerization and deposition of linear, cyclic and aromatic fluorocarbons on (100)-oriented single crystal silicon substrates. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 20 (6) : 1955-1963. ScholarBank@NUS Repository. https://doi.org/10.1116/1.1513640|
|Abstract:||The deposition of fluoropolymer films by plasma polymerization and deposition of linear, cyclic and aromatic hydrocarbons on the Ar plasma-pretreated Si surfaces under different glow discharge conditions was reported. The x-ray photoelectron spectroscopy, Fourier transform infrared spectroscopy, time-of-flight secondary ion mass spectrometry and water contact angle measurements were used to study the effects of radio-frequency plasma power on the chemical composition and structure of plasma-polymerized fluoropolymer films. The results showed strong bonding between Ar plasma-pretreated Si surfaces and the plasma-polymerized and deposited layers.|
|Source Title:||Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Aug 16, 2018
WEB OF SCIENCETM
checked on Jul 16, 2018
checked on Jul 20, 2018
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.