Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.4776191
Title: Method for real-time critical dimensions signature monitoring and control: Sensor, actuator, and experimental results
Authors: Ngo, Y.S.
Ang, K.T.
Tay, A. 
Issue Date: Jan-2013
Citation: Ngo, Y.S., Ang, K.T., Tay, A. (2013-01). Method for real-time critical dimensions signature monitoring and control: Sensor, actuator, and experimental results. Review of Scientific Instruments 84 (1) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.4776191
Abstract: We present in this paper a system and method for real-time monitoring and control of critical dimensions (CD) signature profile in lithography. The proposed system involves the development and integration of a scatterometry system, a programmable multi-zone thermal processing system, and control system software. Based on scatterometry, the intensity and phase of the reflected light from the resist film are measured at a fixed incident angle and across multiple wavelengths. A programmable thermal processing system is then used to adjust the processing temperature during post-exposure baking in lithography to achieve the desired CD signature profile. Experimental results demonstrate the feasibility of the proposed approach. An improvement of CD signature control of 85% is achieved in terms of the mean square error with and without control. © 2013 American Institute of Physics.
Source Title: Review of Scientific Instruments
URI: http://scholarbank.nus.edu.sg/handle/10635/82690
ISSN: 00346748
DOI: 10.1063/1.4776191
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