Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/80902
Title: Optical properties of hydrogenated amorphous silicon carbide films
Authors: Choi, W.K. 
Issue Date: 2000
Citation: Choi, W.K. (2000). Optical properties of hydrogenated amorphous silicon carbide films. Diffusion and Defect Data. Pt A Defect and Diffusion Forum 177 : 29-42. ScholarBank@NUS Repository.
Abstract: The influence of plasma enhanced chemical vapour deposition conditions (rf power, hydrogen dilution), hydrocarbon source material, dopants and deposition techniques on the optical properties of hydrogenated amorphous silicon carbide (a-Si1-xCx:H) films were examined. The parameters used for the discussion were the optical gap, the refractive index and the edge width parameter. The photoluminescence results of a-Si1-xCx:H films were also presented in this paper.
Source Title: Diffusion and Defect Data. Pt A Defect and Diffusion Forum
URI: http://scholarbank.nus.edu.sg/handle/10635/80902
ISSN: 10120386
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

Google ScholarTM

Check


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.