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Title: On the performance limit of impact-ionization transistors
Authors: Shen, C.
Lin, J.-Q.
Toh, E.-H.
Chang, K.-F.
Bait, P.
Heng, C.-H. 
Samudra, G.S. 
Yeo, Y.-C. 
Issue Date: 2007
Citation: Shen, C., Lin, J.-Q., Toh, E.-H., Chang, K.-F., Bait, P., Heng, C.-H., Samudra, G.S., Yeo, Y.-C. (2007). On the performance limit of impact-ionization transistors. Technical Digest - International Electron Devices Meeting, IEDM : 117-120. ScholarBank@NUS Repository.
Abstract: The trade-off between off-state leakage current and switching delay for Impact-Ionization MOS transistor (I-MOS) is pointed out and studied for the first time. This trade-off is unique for I-MOS devices, and is related to the self-amplifying carrier multiplication, the exact phenomenon used to be viewed as a merit. Monte-Carlo simulation is performed to study the random process of carrier multiplication in I-MOS, and the physical limit to the transistor switching delay is assessed. We found that at leakage constraints of 0.1,μA/μm, silicon I-MOS shows long intrinsic switch-on delay (>l0ps) and large random delay variance, hence does not show advantage in the delay/leakage trade-off compared to CMOS devices. © 2007 IEEE.
Source Title: Technical Digest - International Electron Devices Meeting, IEDM
ISSN: 01631918
DOI: 10.1109/IEDM.2007.4418878
Appears in Collections:Staff Publications

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