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|Title:||Epitaxially grown n-ZnOMgOTiN n+ -Si (111) heterostructured light-emitting diode|
|Citation:||Sun, X.W., Zhao, J.L., Tan, S.T., Tan, L.H., Tung, C.H., Lo, G.Q., Kwong, D.L., Zhang, Y.W., Li, X.M., Teo, K.L. (2008). Epitaxially grown n-ZnOMgOTiN n+ -Si (111) heterostructured light-emitting diode. Applied Physics Letters 92 (11) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2896611|
|Abstract:||Epitaxial n-ZnOMgOTiN n+ -Si heterostructured light-emitting diodes have been fabricated. The epitaxial growth of MgOTiN on Si(111) was established by pulsed laser deposition, which was further employed as a buffer layer for epitaxial growth of ZnO layer by metal-organic chemical-vapor deposition. Good epitaxial quality was found using high-resolution x-ray diffraction and transmission electron microscopy. A strong wide electroluminescence band, ranging from 350 to 850 nm and centered at ∼530 nm, was observed from the diode when a positive voltage was applied on Si substrate. The diode exhibited a linear light-output-current characteristic with an injection current up to 192 mA. © 2008 American Institute of Physics.|
|Source Title:||Applied Physics Letters|
|Appears in Collections:||Staff Publications|
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