Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.2120902
DC FieldValue
dc.titleSuppression of oxidation in nickel germanosilicides by Pt incorporation
dc.contributor.authorRahman, M.A.
dc.contributor.authorOsipowicz, T.
dc.contributor.authorPey, K.L.
dc.contributor.authorJin, L.J.
dc.contributor.authorChoi, W.K.
dc.contributor.authorChi, D.Z.
dc.contributor.authorAntoniadis, D.A.
dc.contributor.authorFitzgerald, E.A.
dc.contributor.authorIsaacson, D.M.
dc.date.accessioned2014-10-16T09:43:15Z
dc.date.available2014-10-16T09:43:15Z
dc.date.issued2005-10-31
dc.identifier.citationRahman, M.A., Osipowicz, T., Pey, K.L., Jin, L.J., Choi, W.K., Chi, D.Z., Antoniadis, D.A., Fitzgerald, E.A., Isaacson, D.M. (2005-10-31). Suppression of oxidation in nickel germanosilicides by Pt incorporation. Applied Physics Letters 87 (18) : 1-3. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2120902
dc.identifier.issn00036951
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/98119
dc.description.abstractThe effect of oxidation of 10 nm Ni Si0.75 Ge0.25 and 10 nm Ni (10 at. %Pt) Si0.75 Ge0.25 thin films at annealing temperatures ranging from 400 to 800°C has been studied in detail by Rutherford backscattering spectrometry analysis, cross-sectional transmission electron microscopy, energy dispersive x-ray, and sheet resistance measurements. It is observed that for the films without Pt incorporation, almost two-thirds of the germanosilicide is oxidized. The incorporation of a Pt (10 at. %) into Ni not only dramatically reduces the oxidation of the germanosilicides, but also improves the interfacial roughness and morphology. The integral amount of oxygen found in the germanosilicide in the Ni (10 at. %Pt) Si0.75 Si0.25 films [(1.1±0.17) × 1017 at. cm2] is approximately four times less than that of Ni Si0.75 Si0.25 [(4.0±0.28) × 1017 at. cm2]. This result is explained in terms of the roles of the higher melting point and bond energy of PtSi in NiSi and NiGe, and much lower free energy of the formation of platinum oxide. © 2005 American Institute of Physics.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.2120902
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentPHYSICS
dc.description.doi10.1063/1.2120902
dc.description.sourcetitleApplied Physics Letters
dc.description.volume87
dc.description.issue18
dc.description.page1-3
dc.description.codenAPPLA
dc.identifier.isiut000232886400045
Appears in Collections:Staff Publications

Show simple item record
Files in This Item:
There are no files associated with this item.

SCOPUSTM   
Citations

11
checked on Mar 27, 2020

WEB OF SCIENCETM
Citations

13
checked on Mar 20, 2020

Page view(s)

49
checked on Mar 15, 2020

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.