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Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/97879
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dc.titleSelective electroless silver plating of three dimensional SU-8 microstructures on silicon for metamaterials applications
dc.contributor.authorYan, Y.
dc.contributor.authorIbnur Rashad, M.
dc.contributor.authorTeo, E.J.
dc.contributor.authorTanoto, H.
dc.contributor.authorTeng, J.
dc.contributor.authorBettiol, A.A.
dc.date.accessioned2014-10-16T09:40:23Z
dc.date.available2014-10-16T09:40:23Z
dc.date.issued2011-12-01
dc.identifier.citationYan, Y.,Ibnur Rashad, M.,Teo, E.J.,Tanoto, H.,Teng, J.,Bettiol, A.A. (2011-12-01). Selective electroless silver plating of three dimensional SU-8 microstructures on silicon for metamaterials applications. Optical Materials Express 1 (8) : 1548-1554. ScholarBank@NUS Repository.
dc.identifier.issn21593930
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/97879
dc.description.abstractWe report a method for selective silver coating of SU-8 structures on Si substrates by treating the sample with radio frequency plasma prior to electroless plating. Silver films with high conductivity of 9 × 10-8Ω.m and low surface roughness of 9 nm have been obtained. When combined with two-photon lithography, this process can be utilized for three-dimensional metamaterials applications. Unlike previous work on selective coating, our process can coat directly on SU-8 photoresist that is widely used for two-photon lithography and does not require any resin modification. © 2011 Optical Society of America.
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentPHYSICS
dc.description.sourcetitleOptical Materials Express
dc.description.volume1
dc.description.issue8
dc.description.page1548-1554
dc.identifier.isiutNOT_IN_WOS
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