Please use this identifier to cite or link to this item: https://doi.org/10.1109/JLT.2006.881474
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dc.titleProton-beam writing of poly-methylmethacrylate buried channel waveguides
dc.contributor.authorSum, T.C.
dc.contributor.authorBettiol, A.A.
dc.contributor.authorFlorea, C.
dc.contributor.authorWatt, F.
dc.date.accessioned2014-10-16T09:37:40Z
dc.date.available2014-10-16T09:37:40Z
dc.date.issued2006-10
dc.identifier.citationSum, T.C., Bettiol, A.A., Florea, C., Watt, F. (2006-10). Proton-beam writing of poly-methylmethacrylate buried channel waveguides. Journal of Lightwave Technology 24 (10) : 3803-3809. ScholarBank@NUS Repository. https://doi.org/10.1109/JLT.2006.881474
dc.identifier.issn07338724
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/97645
dc.description.abstractIn this paper, the authors report on the fabrication and characterization of poly-methylmethacrylate (PMMA) buried channel waveguides. The waveguides were fabricated using an emerging lithographic technique known as proton-beam writing. Depending on the proton fluence used, two different waveguide-formation mechanisms are possible. Single-mode waveguides with the light confinement occurring at the end of range were fabricated using fluences < 75 nC/mm2. The refractive-index profiles of these single-mode waveguides were recovered using the propagation mode near-field method. For fluences > 100 nC/mm2, multimode waveguides may also be fabricated with the light confinement occurring beneath the end of range. The compaction of the PMMA surface after proton irradiation was investigated using an atomic force microscope. The propagation losses of these PMMA waveguides were also determined. © 2006 IEEE.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1109/JLT.2006.881474
dc.sourceScopus
dc.subjectCompaction
dc.subjectDirect write
dc.subjectNear-field mode profiles
dc.subjectPMMA buried channel waveguides
dc.subjectPropagation mode near-field method
dc.subjectProton-beam writing
dc.subjectRefractive-index profiles
dc.typeArticle
dc.contributor.departmentPHYSICS
dc.description.doi10.1109/JLT.2006.881474
dc.description.sourcetitleJournal of Lightwave Technology
dc.description.volume24
dc.description.issue10
dc.description.page3803-3809
dc.description.codenJLTED
dc.identifier.isiut000241542700029
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