Please use this identifier to cite or link to this item: https://doi.org/10.1016/S0169-4332(00)00545-6
Title: Preparation and thermal stability of silicon nanoparticles
Authors: Zhu, Y. 
Wang, H. 
Ong, P.P. 
Issue Date: 1-Feb-2001
Citation: Zhu, Y., Wang, H., Ong, P.P. (2001-02-01). Preparation and thermal stability of silicon nanoparticles. Applied Surface Science 171 (1-2) : 44-48. ScholarBank@NUS Repository. https://doi.org/10.1016/S0169-4332(00)00545-6
Abstract: Silicon nanoparticles were prepared in a homemade apparatus by means of a dc sputtering method in which the condensates were collected directly from the cold surface of a liquid nitrogen trap. They were dispersed in 2-propanol under ultrasonic agitation, and dried in the atmosphere. The particles were found to compose of tiny silicon crystals and were only mildly oxidized. Various samples were prepared with different annealing times and temperatures in ultrahigh vacuum. XPS results show that, in the particles, the Si-O bonds of the Si4+ state are the most stable, followed next by the unoxidized state Si0. The intermediate oxidation states are the least stable; they exist only at sufficiently low temperatures (300 °C or lower) and are converted to either Si0 or Si4+ at higher temperatures.
Source Title: Applied Surface Science
URI: http://scholarbank.nus.edu.sg/handle/10635/97588
ISSN: 01694332
DOI: 10.1016/S0169-4332(00)00545-6
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

SCOPUSTM   
Citations

12
checked on Dec 4, 2019

WEB OF SCIENCETM
Citations

11
checked on Nov 27, 2019

Page view(s)

67
checked on Nov 30, 2019

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.