Please use this identifier to cite or link to this item:
https://doi.org/10.1007/s00542-001-0139-5
DC Field | Value | |
---|---|---|
dc.title | Nickel and copper electroplating of proton beam micromachined SU-8 resist | |
dc.contributor.author | Van Kan, J.A. | |
dc.contributor.author | Rajta, I. | |
dc.contributor.author | Ansari, K. | |
dc.contributor.author | Bettiol, A.A. | |
dc.contributor.author | Watt, F. | |
dc.date.accessioned | 2014-10-16T09:33:54Z | |
dc.date.available | 2014-10-16T09:33:54Z | |
dc.date.issued | 2002-09 | |
dc.identifier.citation | Van Kan, J.A., Rajta, I., Ansari, K., Bettiol, A.A., Watt, F. (2002-09). Nickel and copper electroplating of proton beam micromachined SU-8 resist. Microsystem Technologies 8 (6) : 383-386. ScholarBank@NUS Repository. https://doi.org/10.1007/s00542-001-0139-5 | |
dc.identifier.issn | 09467076 | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/97323 | |
dc.description.abstract | Proton beam micromachining (PBM) has been shown to be a powerful technique to produce three-dimensional (3D) high-aspect-ratio microstructures (Watt et al., 2000). Potential commercial applications of PBM, which is a fast direct write technique, will become feasible if the fabrication of metallic molds or stamps is realised. Metallic components can be produced by electroplating a master from a microstructure produced in resist. The production of high-aspect-ratio metallic stamps and molds requires a lithographic technique capable of producing smooth and near 90° sidewalls and a one to one conversion of a resist structure to a metallic microstructure. PBM is the only technique capable of producing high-aspect-ratio microstructures with sub-micron details via a direct write process. In PBM, SU-8 (Lorenz et al., 1997) resist structures are produced by exposing the SU-8 resist with a focused MeV proton beam followed by chemical development and a subsequent electroplating step using Ni or Cu. The data presented shows that PBM can successfully produce high-aspect-ratio, sub-micron sized smooth metallic structures with near 90° sidewall profiles. | |
dc.description.uri | http://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1007/s00542-001-0139-5 | |
dc.source | Scopus | |
dc.type | Article | |
dc.contributor.department | PHYSICS | |
dc.description.doi | 10.1007/s00542-001-0139-5 | |
dc.description.sourcetitle | Microsystem Technologies | |
dc.description.volume | 8 | |
dc.description.issue | 6 | |
dc.description.page | 383-386 | |
dc.identifier.isiut | 000178720100004 | |
Appears in Collections: | Staff Publications |
Show simple item record
Files in This Item:
There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.