Please use this identifier to cite or link to this item:
https://doi.org/10.1016/j.nimb.2010.01.015
DC Field | Value | |
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dc.title | Micromachining of amplitude and phase modulated reflective computer generated hologram patterns in silicon | |
dc.contributor.author | Ow, Y.S. | |
dc.contributor.author | Breese, M.B.H. | |
dc.contributor.author | Leng, Y.R. | |
dc.contributor.author | Azimi, S. | |
dc.contributor.author | Teo, E.J. | |
dc.contributor.author | Sun, X.W. | |
dc.date.accessioned | 2014-10-16T09:32:23Z | |
dc.date.available | 2014-10-16T09:32:23Z | |
dc.date.issued | 2010-05-01 | |
dc.identifier.citation | Ow, Y.S., Breese, M.B.H., Leng, Y.R., Azimi, S., Teo, E.J., Sun, X.W. (2010-05-01). Micromachining of amplitude and phase modulated reflective computer generated hologram patterns in silicon. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms 268 (9) : 1416-1421. ScholarBank@NUS Repository. https://doi.org/10.1016/j.nimb.2010.01.015 | |
dc.identifier.issn | 0168583X | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/97194 | |
dc.description.abstract | Silicon has been machined on lateral resolutions of micrometers and on depth resolutions of nanometers using a recently-developed process based on ion irradiation and electrochemical anodisation. Here we investigate its use as a recording medium for computer generated hologram patterns. We describe the fabrication of both amplitude and phase binary modulated reflective computer generated hologram patterns on a silicon surface with pixel sizes of 5 μm. We further discuss the use of micromachined silicon to variably modulate both amplitude and phase in a continuous, rather than a binary fashion. © 2010 Elsevier B.V. All rights reserved. | |
dc.description.uri | http://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1016/j.nimb.2010.01.015 | |
dc.source | Scopus | |
dc.subject | Computer generated holograms | |
dc.subject | Holography | |
dc.subject | Ion beam irradiation | |
dc.subject | Micromachining | |
dc.subject | Silicon | |
dc.type | Article | |
dc.contributor.department | PHYSICS | |
dc.description.doi | 10.1016/j.nimb.2010.01.015 | |
dc.description.sourcetitle | Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms | |
dc.description.volume | 268 | |
dc.description.issue | 9 | |
dc.description.page | 1416-1421 | |
dc.description.coden | NIMBE | |
dc.identifier.isiut | 000277679300009 | |
Appears in Collections: | Staff Publications |
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