Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.355892
DC FieldValue
dc.titleEnergies for atomic emissions from defect sites on the Si surfaces: The effects of halogen adsorbates
dc.contributor.authorKhoo, G.S.
dc.contributor.authorOng, C.K.
dc.contributor.authorItoh, N.
dc.contributor.authorKanasaki, J.
dc.date.accessioned2014-10-16T09:23:36Z
dc.date.available2014-10-16T09:23:36Z
dc.date.issued1994
dc.identifier.citationKhoo, G.S., Ong, C.K., Itoh, N., Kanasaki, J. (1994). Energies for atomic emissions from defect sites on the Si surfaces: The effects of halogen adsorbates. Journal of Applied Physics 75 (1) : 255-258. ScholarBank@NUS Repository. https://doi.org/10.1063/1.355892
dc.identifier.issn00218979
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/96454
dc.description.abstractA study was made of the energies for ejection of Si atoms and SiCl molecules from defect sites on Si (100) and (110) surfaces, including adatoms, kinks, and vacancies, with and without interaction with Cl adsorbates. It is found that the energies for emitting a Si atom from defect sites are smaller than those for the perfect site and almost proportional to the coordination number for the Si (110) surface. It is also found that the interaction of Cl with defects reduces the energy for the ejection of a Si atom and a SiCl molecule, depending on the adsorption site.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.355892
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentPHYSICS
dc.description.doi10.1063/1.355892
dc.description.sourcetitleJournal of Applied Physics
dc.description.volume75
dc.description.issue1
dc.description.page255-258
dc.identifier.isiutA1994MQ40200036
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