Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/96047
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dc.titleComposition and diffusion of nitrogenated carbon into the magnetic layer
dc.contributor.authorTomcik, B.
dc.contributor.authorOsipowicz, T.
dc.contributor.authorHuan, C.H.
dc.date.accessioned2014-10-16T09:18:52Z
dc.date.available2014-10-16T09:18:52Z
dc.date.issued2000-05-01
dc.identifier.citationTomcik, B.,Osipowicz, T.,Huan, C.H. (2000-05-01). Composition and diffusion of nitrogenated carbon into the magnetic layer. Journal of Applied Physics 87 (9 III) : 6167-6169. ScholarBank@NUS Repository.
dc.identifier.issn00218979
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/96047
dc.description.abstractA series of dc sputter deposited amorphous carbon nitride films were characterized by micro-Raman spectroscopy. Films were deposited on silicon, CoCrPt/CrV/glass and a CoCrPtTa/CrV/glass substrate. A direct correlation was found between the nitrogen content in a film, measured by Rutherford backscattering spectroscopy, and the Raman C≡N peak intensity. A frequency downshift of the Raman G band was observed for very thin films. It reflects not only the film structure but also the contribution from the vibration spectrum of the film-substrate interface. From the integrated intensity of the carbon band and a Raman shift it is possible to determine the thickness of the carbon overcoat as well as evaluate the carbon diffusion into the magnetic layer. A secondary ion mass spectroscopy carbon depth profile analysis provided additional proof of carbon diffusion into the magnetic layer. © 2000 American Institute of Physics.
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentPHYSICS
dc.description.sourcetitleJournal of Applied Physics
dc.description.volume87
dc.description.issue9 III
dc.description.page6167-6169
dc.description.codenJAPIA
dc.identifier.isiutNOT_IN_WOS
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