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https://scholarbank.nus.edu.sg/handle/10635/92775
DC Field | Value | |
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dc.title | Preparation of (001)-oriented PZT thick films on silicon wafer by pulsed laser deposition | |
dc.contributor.author | Liu, J.-M. | |
dc.contributor.author | Xu, S.Y. | |
dc.contributor.author | Zhou, W.Z. | |
dc.contributor.author | Jiang, X.H. | |
dc.contributor.author | Ong, C.K. | |
dc.contributor.author | Lim, L.C. | |
dc.date.accessioned | 2014-10-16T03:08:21Z | |
dc.date.available | 2014-10-16T03:08:21Z | |
dc.date.issued | 1999 | |
dc.identifier.citation | Liu, J.-M.,Xu, S.Y.,Zhou, W.Z.,Jiang, X.H.,Ong, C.K.,Lim, L.C. (1999). Preparation of (001)-oriented PZT thick films on silicon wafer by pulsed laser deposition. Materials Science and Engineering A 269 (1-2) : 67-72. ScholarBank@NUS Repository. | |
dc.identifier.issn | 09215093 | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/92775 | |
dc.description.abstract | Completely (001)-oriented Pb(Zr0.52Ti0.48)O3 (PZT) films up to ∼ 10 μm thick, deposited on (100) silicon wafers with Y-stabilized ZrO2 (YSZ) as buffer and YBCO as electrode, are prepared by using pulsed laser deposition. The X-ray rocking curve scanning with respect to (001) reflection of 6.0-μm thick films exhibits the FWHM of only 0.6-0.7°. Small grain size and smooth surface of the as-prepared films were identified. The performance of YSZ as excellent resisting layer against silicon diffusion was confirmed by the SIMS measurements. The electrical property evaluations demonstrated quite good ferroelectric property. A piezoelectric coefficient d31 ∼ -300 pC/N, acceptable for piezoelectric applications, was measured. © 1999 Elsevier Science S.A. All rights reserved. | |
dc.source | Scopus | |
dc.subject | Ferroelectric and piezoelectric property | |
dc.subject | Pulsed laser deposition | |
dc.subject | PZT thick film | |
dc.type | Article | |
dc.contributor.department | PHYSICS | |
dc.contributor.department | MECHANICAL & PRODUCTION ENGINEERING | |
dc.description.sourcetitle | Materials Science and Engineering A | |
dc.description.volume | 269 | |
dc.description.issue | 1-2 | |
dc.description.page | 67-72 | |
dc.identifier.isiut | NOT_IN_WOS | |
Appears in Collections: | Staff Publications |
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