Please use this identifier to cite or link to this item: https://doi.org/10.1109/TMAG.2011.2140363
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dc.titleCompositional effects on the structure and phase transition of epitaxial FeRh thin films
dc.contributor.authorCher, K.M.
dc.contributor.authorZhou, T.J.
dc.contributor.authorChen, J.S.
dc.date.accessioned2014-10-07T09:55:44Z
dc.date.available2014-10-07T09:55:44Z
dc.date.issued2011-10
dc.identifier.citationCher, K.M., Zhou, T.J., Chen, J.S. (2011-10). Compositional effects on the structure and phase transition of epitaxial FeRh thin films. IEEE Transactions on Magnetics 47 (10) : 4033-4036. ScholarBank@NUS Repository. https://doi.org/10.1109/TMAG.2011.2140363
dc.identifier.issn00189464
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/86866
dc.description.abstractCompositional and temperature dependent ferromagnetic/anti-ferromagnetic transition of highly textured Fe100-xRhx (where x = 35 to 65) thin films deposited epitaxially on MgO (001) single crystal substrates were studied. First-order transition from ferromagnetic to anti-ferromagnetic phase was observed around 48 at. % Rh where x-ray diffraction spectra revealed a sharp discontinued decrease in lattice parameter-c coupled with a sudden decrease in magnetization from 1600 to 200 emu/cm3. The transition was sharp compared to non-textured randomly oriented thin films, bearing similarities to bulk FeRh. Temperature-dependent x-ray diffraction spectra and magnetic measurements revealed the occurrence of temperature induced anti-ferromagnetic to ferromagnetic phase transitions for films with Rh content larger than 47 at. %. The temperatures at which such transitions occurred were dependent on the Rh content, and broadened with increasing amounts of Rh. © 2011 IEEE.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1109/TMAG.2011.2140363
dc.sourceScopus
dc.subjectEpitaxial growth
dc.subjectFeRh
dc.subjectfirst-order phase transition
dc.subjectthin films
dc.typeConference Paper
dc.contributor.departmentMATERIALS SCIENCE AND ENGINEERING
dc.description.doi10.1109/TMAG.2011.2140363
dc.description.sourcetitleIEEE Transactions on Magnetics
dc.description.volume47
dc.description.issue10
dc.description.page4033-4036
dc.description.codenIEMGA
dc.identifier.isiut000296418200440
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