Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.2175494
DC FieldValue
dc.titleNanoscaled electrical homogeneity of indium zinc oxide films
dc.contributor.authorKumar, B.
dc.contributor.authorGong, H.
dc.contributor.authorGosvami, N.N.
dc.contributor.authorAkkipeddi, R.
dc.contributor.authorO'Shea, S.J.
dc.date.accessioned2014-10-07T09:52:29Z
dc.date.available2014-10-07T09:52:29Z
dc.date.issued2006-02-27
dc.identifier.citationKumar, B., Gong, H., Gosvami, N.N., Akkipeddi, R., O'Shea, S.J. (2006-02-27). Nanoscaled electrical homogeneity of indium zinc oxide films. Applied Physics Letters 88 (9) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2175494
dc.identifier.issn00036951
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/86589
dc.description.abstractWe are able to fabricate both polycrystalline and amorphous indium zinc oxide thin films. All the thin films exhibited an n -type semiconductor behavior with room-temperature conductivities in the range of 2.5× 103 -1.58× 103 (Ω cm)-1. A nanoscaled conductivity inhomogeneity was observed in polycrystalline films by means of conducting atomic force microscopy, with morphology effect excluded by simultaneous topographic mapping. This effect has been explained in the presence of highly conducting In2 O3 and Zn2 In2 O5 nano crystalline phases imbedded in amorphous matrix. On the other hand, excellent electrical homogeneity throughout the amorphous film was observed, suggesting its promising potential in microelectronic device applications. © 2006 American Institute of Physics.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.2175494
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentMATERIALS SCIENCE AND ENGINEERING
dc.description.doi10.1063/1.2175494
dc.description.sourcetitleApplied Physics Letters
dc.description.volume88
dc.description.issue9
dc.description.page-
dc.description.codenAPPLA
dc.identifier.isiut000235736300077
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