Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.2212052
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dc.titleMorphological stability of the Stranski-Krastanow systems under an electric field
dc.contributor.authorChiu, C.-H.
dc.contributor.authorPoh, C.T.
dc.contributor.authorHuang, Z.
dc.date.accessioned2014-10-07T09:52:11Z
dc.date.available2014-10-07T09:52:11Z
dc.date.issued2006-06-12
dc.identifier.citationChiu, C.-H., Poh, C.T., Huang, Z. (2006-06-12). Morphological stability of the Stranski-Krastanow systems under an electric field. Applied Physics Letters 88 (24) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2212052
dc.identifier.issn00036951
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/86565
dc.description.abstractThe morphological stability of the Stranski-Krastanow (SK) system against surface undulation is investigated for the case where the SK system consists of a conductor film and a thick substrate and it is under the influence of an electric field induced by an electrode above the film. It is shown that a flat electrode reduces the critical thickness below which the SK system is completely stable against surface undulation. Applying a wavy electrode to the completely stable system, on the other hand, causes the flat film surface to develop into an equilibrium ripple profile. © 2006 American Institute of Physics.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.2212052
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentMATERIALS SCIENCE AND ENGINEERING
dc.description.doi10.1063/1.2212052
dc.description.sourcetitleApplied Physics Letters
dc.description.volume88
dc.description.issue24
dc.description.page-
dc.description.codenAPPLA
dc.identifier.isiut000238314800024
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