Please use this identifier to cite or link to this item:
https://doi.org/10.1063/1.2212052
DC Field | Value | |
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dc.title | Morphological stability of the Stranski-Krastanow systems under an electric field | |
dc.contributor.author | Chiu, C.-H. | |
dc.contributor.author | Poh, C.T. | |
dc.contributor.author | Huang, Z. | |
dc.date.accessioned | 2014-10-07T09:52:11Z | |
dc.date.available | 2014-10-07T09:52:11Z | |
dc.date.issued | 2006-06-12 | |
dc.identifier.citation | Chiu, C.-H., Poh, C.T., Huang, Z. (2006-06-12). Morphological stability of the Stranski-Krastanow systems under an electric field. Applied Physics Letters 88 (24) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2212052 | |
dc.identifier.issn | 00036951 | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/86565 | |
dc.description.abstract | The morphological stability of the Stranski-Krastanow (SK) system against surface undulation is investigated for the case where the SK system consists of a conductor film and a thick substrate and it is under the influence of an electric field induced by an electrode above the film. It is shown that a flat electrode reduces the critical thickness below which the SK system is completely stable against surface undulation. Applying a wavy electrode to the completely stable system, on the other hand, causes the flat film surface to develop into an equilibrium ripple profile. © 2006 American Institute of Physics. | |
dc.description.uri | http://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.2212052 | |
dc.source | Scopus | |
dc.type | Article | |
dc.contributor.department | MATERIALS SCIENCE AND ENGINEERING | |
dc.description.doi | 10.1063/1.2212052 | |
dc.description.sourcetitle | Applied Physics Letters | |
dc.description.volume | 88 | |
dc.description.issue | 24 | |
dc.description.page | - | |
dc.description.coden | APPLA | |
dc.identifier.isiut | 000238314800024 | |
Appears in Collections: | Staff Publications |
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