Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.3601362
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dc.titleLeakage mechanism of cation -modified BiFeO3 thin film
dc.contributor.authorWu, J.
dc.contributor.authorWang, J.
dc.contributor.authorXiao, D.
dc.contributor.authorZhu, J.
dc.date.accessioned2014-10-07T09:51:18Z
dc.date.available2014-10-07T09:51:18Z
dc.date.issued2011
dc.identifier.citationWu, J., Wang, J., Xiao, D., Zhu, J. (2011). Leakage mechanism of cation -modified BiFeO3 thin film. AIP Advances 1 (2) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3601362
dc.identifier.issn21583226
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/86491
dc.description.abstractTo investigate the leakage mechanisms in cation -substituted BiFeO 3 (BFO) thin films, in Bi site or Fe site or both sites, Bi 0.92La0.08FeO3, BiFe0.95Mn 0.05O3, and Bi0.92La0.08Fe 0.95Mn0.05O3 thin films were grown in situ by radio frequency magnetic sputtering on SrRuO3/SrTiO3(111) substrates, where the (111) orientation is established in all thin films. The variation in cation substitution results in different leakage behavior of BFO thin films. Space charge limited conduction and a grain boundary limited behavior are responsible for the leakage behavior of Bi0.92La 0.08FeO3 and BiFe0.95Mn0.05O 3 thin films in a low electric field region, respectively, while an interface-limited Fowler-Nordheim tunneling is involved in their leakage behavior in a high electric field region. In contrast, the leakage of Bi 0.92La0.08Fe0.95Mn0.05O3 endures a transition from an Ohmic conduction to space charge limited conduction with increasing electric fields. The three thin films however show little temperature dependence of the leakage behavior in the temperature range investigated. © 2011 Author(s).
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.3601362
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentMATERIALS SCIENCE AND ENGINEERING
dc.description.doi10.1063/1.3601362
dc.description.sourcetitleAIP Advances
dc.description.volume1
dc.description.issue2
dc.description.page-
dc.identifier.isiut000302137000036
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