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Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.jmmm.2006.11.142
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dc.titleHigh perpendicular coercivity co-ferrite films with (1 1 1) texture using pulsed laser deposition
dc.contributor.authorYin, J.H.
dc.contributor.authorDing, J.
dc.contributor.authorLiu, B.H.
dc.contributor.authorMiao, X.S.
dc.contributor.authorChen, J.S.
dc.date.accessioned2014-10-07T09:50:13Z
dc.date.available2014-10-07T09:50:13Z
dc.date.issued2007-03
dc.identifier.citationYin, J.H., Ding, J., Liu, B.H., Miao, X.S., Chen, J.S. (2007-03). High perpendicular coercivity co-ferrite films with (1 1 1) texture using pulsed laser deposition. Journal of Magnetism and Magnetic Materials 310 (2 SUPPL. PART 3) : 2537-2539. ScholarBank@NUS Repository. https://doi.org/10.1016/j.jmmm.2006.11.142
dc.identifier.issn03048853
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/86396
dc.description.abstractCo-ferrite films with a thickness of ∼100 nm on SiO2 (0 0 1) substrates were deposited using a pulsed laser deposition (PLD) system at different substrate temperature (ST). High coercivity of 10.5 kOe and large perpendicular anisotropy have been obtained in the film with ST at 550 °C. The microstructural investigation reveals that high coercivity with perpendicular anisotropy of these co-ferrite films is found to be related to a nanocystalline structure, large residual strain, and preferential (1 1 1) textured structure. © 2006 Elsevier B.V. All rights reserved.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1016/j.jmmm.2006.11.142
dc.sourceScopus
dc.subjectCo-ferrite films
dc.subjectHigh coercivity
dc.subjectPulsed laser deposition
dc.subjectTexture structure
dc.typeArticle
dc.contributor.departmentMATERIALS SCIENCE AND ENGINEERING
dc.contributor.departmentCHEMISTRY
dc.description.doi10.1016/j.jmmm.2006.11.142
dc.description.sourcetitleJournal of Magnetism and Magnetic Materials
dc.description.volume310
dc.description.issue2 SUPPL. PART 3
dc.description.page2537-2539
dc.description.codenJMMMD
dc.identifier.isiut000247720400223
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