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https://doi.org/10.1063/1.3156689
DC Field | Value | |
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dc.title | Effects and thermal stability of hydrogen microwave plasma treatment on tetrahedral amorphous carbon films by in situ ultraviolet photoelectron spectroscopy | |
dc.contributor.author | Chua, D.H.C. | |
dc.contributor.author | Hsieh, J. | |
dc.contributor.author | Gao, X. | |
dc.contributor.author | Qi, D. | |
dc.contributor.author | Chen, S. | |
dc.contributor.author | Varghese, B. | |
dc.contributor.author | Sow, C.H. | |
dc.contributor.author | Wee, A.T.S. | |
dc.contributor.author | Lu, J. | |
dc.contributor.author | Loh, K.P. | |
dc.contributor.author | Yu, X. | |
dc.contributor.author | Moser, H.O. | |
dc.date.accessioned | 2014-10-07T09:48:48Z | |
dc.date.available | 2014-10-07T09:48:48Z | |
dc.date.issued | 2009 | |
dc.identifier.citation | Chua, D.H.C., Hsieh, J., Gao, X., Qi, D., Chen, S., Varghese, B., Sow, C.H., Wee, A.T.S., Lu, J., Loh, K.P., Yu, X., Moser, H.O. (2009). Effects and thermal stability of hydrogen microwave plasma treatment on tetrahedral amorphous carbon films by in situ ultraviolet photoelectron spectroscopy. Journal of Applied Physics 106 (2) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3156689 | |
dc.identifier.issn | 00218979 | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/86276 | |
dc.description.abstract | This paper reports a comprehensive experimental study on the effects of hydrogen microwave plasma treatment on nonhydrogenated high s p3 content tetrahedral amorphous carbon (ta-C) film. In this study, a surface C-H dipole layer was first observed by high resolution electron energy loss spectroscopy, showing the presence of C-H bonding states. This resulted in the enhancement of electron field emission of the plasma treated films by largely lowering the turn-on field. Thermal stability tests using in situ ultraviolet photoelectron spectroscopy confirm that the C-H dipole layer not only reduces the work function of the films, it is extremely stable in both ambient and vacuum conditions and can sustain up to 600 °C annealing in vacuum. Atomic force microscopy studies also show minimal modifications to the surface morphology, leading to the conclusion that the C-H dipole layer is responsible for lowering the work function. This has improved the electron emission properties which can lead to potential applications such as electron emission displays. © 2009 American Institute of Physics. | |
dc.description.uri | http://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.3156689 | |
dc.source | Scopus | |
dc.type | Article | |
dc.contributor.department | PHYSICS | |
dc.contributor.department | SINGAPORE SYNCHROTRON LIGHT SOURCE | |
dc.contributor.department | CHEMISTRY | |
dc.contributor.department | NUS NANOSCIENCE & NANOTECH INITIATIVE | |
dc.contributor.department | MATERIALS SCIENCE AND ENGINEERING | |
dc.description.doi | 10.1063/1.3156689 | |
dc.description.sourcetitle | Journal of Applied Physics | |
dc.description.volume | 106 | |
dc.description.issue | 2 | |
dc.description.page | - | |
dc.description.coden | JAPIA | |
dc.identifier.isiut | 000268613000154 | |
Appears in Collections: | Staff Publications |
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