Please use this identifier to cite or link to this item:
Title: Microstructure evolution of Ni80Fe20-Cu deposited by electroplating under an applied field
Authors: Yi, J.B. 
Li, X.P. 
Ding, J. 
Yin, J.H.
Thongmee, S. 
Seet, H.L. 
Keywords: Applied field
Composite wire
Magnetoimpedence (MI)
Issue Date: Jun-2007
Citation: Yi, J.B., Li, X.P., Ding, J., Yin, J.H., Thongmee, S., Seet, H.L. (2007-06). Microstructure evolution of Ni80Fe20-Cu deposited by electroplating under an applied field. IEEE Transactions on Magnetics 43 (6) : 2980-2982. ScholarBank@NUS Repository.
Abstract: A study of the microstructure evolution of Ni80Fe 20-Cu composite wires made by electrodeposition under an applied magnetic field is presented. Ni80Fe20-Cu composite wire samples were deposited by electroplating under an applied field parallel to the wire axis and varying from 0 to 400 Oe. Magnetoimpedence (MI) measurement showed that the magnitude of MI first scaled with the increasing of the applied field until the field was larger than 200 Oe. Further increasing the applied field led to the reduction of MI effect. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) indicated that the surface deposited under the applied field of 200 Oe was the best in terms of smoothness and uniformity, indicating that the applied field affected the growth of the deposited layers. The composite wire under 200 Oe applied field possessed a low coercivity (0.35 Oe) and small grain size, which may be attributed to the high MI effect. The surface morphology change is due to the magnetohydrodynamic (MHD) effect. © 2007 IEEE.
Source Title: IEEE Transactions on Magnetics
ISSN: 00189464
DOI: 10.1109/TMAG.2007.893416
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

Google ScholarTM



Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.