Please use this identifier to cite or link to this item: https://doi.org/10.1149/1.2180911
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dc.titleCharacterization of amorphous LiNiVO4 thin-film anode grown by pulsed laser deposition
dc.contributor.authorTang, S.B.
dc.contributor.authorXia, H.
dc.contributor.authorLai, M.O.
dc.contributor.authorLu, L.
dc.date.accessioned2014-10-07T09:01:40Z
dc.date.available2014-10-07T09:01:40Z
dc.date.issued2006
dc.identifier.citationTang, S.B., Xia, H., Lai, M.O., Lu, L. (2006). Characterization of amorphous LiNiVO4 thin-film anode grown by pulsed laser deposition. Journal of the Electrochemical Society 153 (5) : A875-A879. ScholarBank@NUS Repository. https://doi.org/10.1149/1.2180911
dc.identifier.issn00134651
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/84905
dc.description.abstractLiNiV O4 thin-film anode deposited under 8 mTorr of O2 and room temperature by pulsed laser deposition has been characterized by electrochemical tests and physical analyses. A retainable capacity as high as 410 μAh cm2 μm with only 10.4% of initial irreversible capacity loss was achieved, corresponding to more than 7 lithium ions intercalated per LiNiV O4 formula unit. The linear dependence of peak current on the square root of scan rates by cyclic voltammogram (CV) gave an apparent Li+ diffusion coefficient of 1.9× 10-12 cm2 s. Alternating current (ac) impedance revealed a small charge transfer resistance of 52 Ω at 1.32 V, indicating that lithium ion is easily inserted in and extracted from the as-deposited LiNiV O4 film anode. Ex situ X-ray photoelectron spectroscopy (XPS) analysis on the as-deposited and lithiated films confirmed that vanadium cations were reduced to some extent with the lithium intercalation. The cathodic peaks at 1.71 and 0.53 V with a shoulder around 0.95 V in CV scans may correspond to the different reduction processes of vanadium. The as-deposited film was mainly amorphous and smooth, with a surface roughness of only 2.835 nm. The lithiated film remained amorphous and had only a minor change in surface topography. © 2006 The Electrochemical Society. All rights reserved.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1149/1.2180911
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentMECHANICAL ENGINEERING
dc.description.doi10.1149/1.2180911
dc.description.sourcetitleJournal of the Electrochemical Society
dc.description.volume153
dc.description.issue5
dc.description.pageA875-A879
dc.description.codenJESOA
dc.identifier.isiut000236516000012
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