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Please use this identifier to cite or link to this item: https://doi.org/10.1039/c3ra47396a
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dc.title1.8 v symmetric supercapacitors developed using nanocrystalline Ru films as electrodes
dc.contributor.authorXia, H.
dc.contributor.authorLi, B.
dc.contributor.authorLu, L.
dc.date.accessioned2014-10-07T09:00:02Z
dc.date.available2014-10-07T09:00:02Z
dc.date.issued2014
dc.identifier.citationXia, H., Li, B., Lu, L. (2014). 1.8 v symmetric supercapacitors developed using nanocrystalline Ru films as electrodes. RSC Advances 4 (22) : 11111-11114. ScholarBank@NUS Repository. https://doi.org/10.1039/c3ra47396a
dc.identifier.issn20462069
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/84765
dc.description.abstractNanocrystalline Ru film is deposited on Ni foam by a chemical replacement reaction. The deposited Ru film exhibits a mesoporous structure comprising nanocrystallites and nanopores of 2-3 nm in diameter. A 1.8 V symmetric supercapacitor is developed using nanocrystalline Ru films as both negative and positive electrodes. © 2014 The Royal Society of Chemistry.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1039/c3ra47396a
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentMECHANICAL ENGINEERING
dc.description.doi10.1039/c3ra47396a
dc.description.sourcetitleRSC Advances
dc.description.volume4
dc.description.issue22
dc.description.page11111-11114
dc.description.codenRSCAC
dc.identifier.isiut000332469500012
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