Please use this identifier to cite or link to this item: https://doi.org/10.1109/PVSC.2010.5617187
DC FieldValue
dc.titleSemiconducting β-FeSi2 for high efficiency and low cost photovoltaics
dc.contributor.authorKumar, A.
dc.contributor.authorChi, D.
dc.contributor.authorVerma, L.K.
dc.contributor.authorDanner, A.J.
dc.contributor.authorYang, H.
dc.contributor.authorBhati, C.S.
dc.date.accessioned2014-10-07T04:49:37Z
dc.date.available2014-10-07T04:49:37Z
dc.date.issued2010
dc.identifier.citationKumar, A., Chi, D., Verma, L.K., Danner, A.J., Yang, H., Bhati, C.S. (2010). Semiconducting β-FeSi2 for high efficiency and low cost photovoltaics. Conference Record of the IEEE Photovoltaic Specialists Conference : 3359-3364. ScholarBank@NUS Repository. https://doi.org/10.1109/PVSC.2010.5617187
dc.identifier.isbn9781424458912
dc.identifier.issn01608371
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/84171
dc.description.abstractThe beta phase of iron disilicide, β-FeSi2, behaves as a semiconductor and possesses three desirable material properties: direct band gap of around 0.87 eV, close lattice match with silicon (2-4% mismatch) and abundant availability of its constituent elements on the earth's crust. Moreover, its high optical absorption coefficient (one to two orders of magnitude higher than silicon) makes it a promising next generation semiconductor for photovoltaics with high performance and low environmental burden. The purpose of this work is to examine fundamental properties of β-FeSi2 material for application towards higher efficiency and low cost photovoltaics. Sputter deposition of Fe/Si multilayers was used to fabricate β-FeSi2 films. Conversion of the multilayer films to β-FeSi2 was accomplished by a thermal treatment under N 2atmosphere. β-FeSi2 films fabricated exhibited polycrystalline grains, with a direct energy band gap of 0.87 eV, an absorption coefficient in the order of 105 cm-1 and a residual carrier concentration due to electrons in the order of 1019 cm-3. Results of characterization using x-ray photoelectron spectroscopy, x-ray diffraction, scanning electron microscopy, UV-VIS-IR spectrophotometer measurements and Hall effect measurements have been discussed. © 2010 IEEE.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1109/PVSC.2010.5617187
dc.sourceScopus
dc.typeConference Paper
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.doi10.1109/PVSC.2010.5617187
dc.description.sourcetitleConference Record of the IEEE Photovoltaic Specialists Conference
dc.description.page3359-3364
dc.description.codenCRCND
dc.identifier.isiut000287579503132
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