Please use this identifier to cite or link to this item:
https://doi.org/10.1109/LED.2007.909999
DC Field | Value | |
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dc.title | The effect of an yttrium interlayer on a Ni germanided metal gate workfunction in SiO2/HfO2 | |
dc.contributor.author | Yu, H.P. | |
dc.contributor.author | Pey, K.L. | |
dc.contributor.author | Choi, W.K. | |
dc.contributor.author | Dawood, M.K. | |
dc.contributor.author | Chew, H.G. | |
dc.contributor.author | Antoniadis, D.A. | |
dc.contributor.author | Fitzgerald, E.A. | |
dc.contributor.author | Chi, D.Z. | |
dc.date.accessioned | 2014-10-07T04:38:00Z | |
dc.date.available | 2014-10-07T04:38:00Z | |
dc.date.issued | 2007-12 | |
dc.identifier.citation | Yu, H.P., Pey, K.L., Choi, W.K., Dawood, M.K., Chew, H.G., Antoniadis, D.A., Fitzgerald, E.A., Chi, D.Z. (2007-12). The effect of an yttrium interlayer on a Ni germanided metal gate workfunction in SiO2/HfO2. IEEE Electron Device Letters 28 (12) : 1098-1101. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2007.909999 | |
dc.identifier.issn | 07413106 | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/83160 | |
dc.description.abstract | In this letter, the tuning of a nickel fully germanided metal gate effective workfunction via a hyperthin yttrium (Y) interlayer at the bottom of the metal electrode was demonstrated on both SiO2 and HfO2. By varying the Y interlayer thickness from 0 to 9.6 nm, a full range of workfunction tuning from 5.11 to 3.65 eV has been achieved on NiGeY/SiO2 stacks. It was also found that the chemical potential of the material that is adjacent to the gate electrode/gate insulator plays an important role in the determination of the effective workfunction. This workfunction tuning window was observed to decrease to a range of 5.08-4.25 eV on NiGeY/HfO2 stacks. © 2007 IEEE. | |
dc.description.uri | http://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1109/LED.2007.909999 | |
dc.source | Scopus | |
dc.subject | High-κ | |
dc.subject | Metal gate | |
dc.subject | Metal gates | |
dc.subject | Ni germanide (NiGe) | |
dc.subject | Nickel | |
dc.subject | Workfunction tuning | |
dc.type | Article | |
dc.contributor.department | ELECTRICAL & COMPUTER ENGINEERING | |
dc.description.doi | 10.1109/LED.2007.909999 | |
dc.description.sourcetitle | IEEE Electron Device Letters | |
dc.description.volume | 28 | |
dc.description.issue | 12 | |
dc.description.page | 1098-1101 | |
dc.description.coden | EDLED | |
dc.identifier.isiut | 000251429800008 | |
Appears in Collections: | Staff Publications |
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