Please use this identifier to cite or link to this item:
https://doi.org/10.1109/LED.2009.2034111
DC Field | Value | |
---|---|---|
dc.title | Schottky barrier height modulation of nickeldysprosium-alloy germanosilicide contacts for strained P-FinFETs | |
dc.contributor.author | Sinha, M. | |
dc.contributor.author | Lee, R.T.P. | |
dc.contributor.author | Chor, E.F. | |
dc.contributor.author | Yeo, Y.-C. | |
dc.date.accessioned | 2014-10-07T04:36:01Z | |
dc.date.available | 2014-10-07T04:36:01Z | |
dc.date.issued | 2009-12 | |
dc.identifier.citation | Sinha, M., Lee, R.T.P., Chor, E.F., Yeo, Y.-C. (2009-12). Schottky barrier height modulation of nickeldysprosium-alloy germanosilicide contacts for strained P-FinFETs. IEEE Electron Device Letters 30 (12) : 1278-1280. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2009.2034111 | |
dc.identifier.issn | 07413106 | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/82998 | |
dc.description.abstract | This letter reports on the fabrication and hole Schottky barrier Φp p modulation of a novel nickel (Ni)dysprosium (Dy)-alloy germanosilicide (NiDySiGe) on silicongermanium (SiGe). Aluminum (Al) implant is utilized to lower the Φp p of NiDySiGe from ̃0.5 to ̃0.12 eV, with a correspondingly increasing Al dose in the range of 0-2 × 1015 atoms/cm2. When integrated as the contact silicide in p-FinFETs (with SiGe source/drain), NiDySiGe with an Al implant dose of 2 × 1014 atoms cm2 leads to 32% enhancement in IDSAT over p-FinFETs with conventional NiSiGe contacts. NiDy-alloy silicide is a promising single silicide solution for series-resistance reduction in CMOS FinFETs. © 2009 IEEE. | |
dc.description.uri | http://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1109/LED.2009.2034111 | |
dc.source | Scopus | |
dc.subject | Aluminum implant | |
dc.subject | Contact resistance | |
dc.subject | FinFETs | |
dc.subject | Nickel (Ni)-dysprosium (Dy)-alloy germanosilicide (NiDySiGe) | |
dc.subject | Schottky barrier height | |
dc.type | Article | |
dc.contributor.department | ELECTRICAL & COMPUTER ENGINEERING | |
dc.description.doi | 10.1109/LED.2009.2034111 | |
dc.description.sourcetitle | IEEE Electron Device Letters | |
dc.description.volume | 30 | |
dc.description.issue | 12 | |
dc.description.page | 1278-1280 | |
dc.description.coden | EDLED | |
dc.identifier.isiut | 000272044500010 | |
Appears in Collections: | Staff Publications |
Show simple item record
Files in This Item:
There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.