Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.4754858
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dc.titleMagnetization reversal and magnetoresistance behavior of perpendicularly magnetized [Co/Pd] 4/Au/[Co/Pd] 2 nanowires
dc.contributor.authorLiu, X.M.
dc.contributor.authorHo, P.
dc.contributor.authorChen, J.S.
dc.contributor.authorAdeyeye, A.O.
dc.date.accessioned2014-10-07T04:31:56Z
dc.date.available2014-10-07T04:31:56Z
dc.date.issued2012-10-01
dc.identifier.citationLiu, X.M., Ho, P., Chen, J.S., Adeyeye, A.O. (2012-10-01). Magnetization reversal and magnetoresistance behavior of perpendicularly magnetized [Co/Pd] 4/Au/[Co/Pd] 2 nanowires. Journal of Applied Physics 112 (7) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.4754858
dc.identifier.issn00218979
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/82655
dc.description.abstractWe present a systematic investigation of the magnetization reversal mechanism and magnetoresistance behavior of perpendicularly magnetized Co/Pd multilayer films and nanowires (NWs) as a function of Cu buffer layer thickness and temperature. The effect of interlayer coupling is studied by varying the Au spacer layer thickness in between two Co/Pd multilayer stacks in the [Co/Pd] 4/Au/[Co/Pd] 2 structure. We observed that compared with continuous (un-patterned) films deposited at the same time, the NWs display much stronger temperature dependent interlayer coupling due to magnetostatic interactions through the stray fields. At low temperature, the competition between the interlayer coupling and coercive field difference between the soft and hard Co/Pd multilayer stacks determines the overall magnetization reversal process and magnetoresistance behavior. © 2012 American Institute of Physics.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.4754858
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.contributor.departmentMATERIALS SCIENCE AND ENGINEERING
dc.description.doi10.1063/1.4754858
dc.description.sourcetitleJournal of Applied Physics
dc.description.volume112
dc.description.issue7
dc.description.page-
dc.description.codenJAPIA
dc.identifier.isiut000310489400071
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