Please use this identifier to cite or link to this item:
https://doi.org/10.1109/LED.2006.886708
DC Field | Value | |
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dc.title | I-MOS transistor with an elevated silicon-germanium impact-ionization region for bandgap engineering | |
dc.contributor.author | Toh, E.-H. | |
dc.contributor.author | Wang, G.H. | |
dc.contributor.author | Chan, L. | |
dc.contributor.author | Lo, G.-Q. | |
dc.contributor.author | Samudra, G. | |
dc.contributor.author | Yeo, Y.-C. | |
dc.date.accessioned | 2014-10-07T04:30:03Z | |
dc.date.available | 2014-10-07T04:30:03Z | |
dc.date.issued | 2006-12 | |
dc.identifier.citation | Toh, E.-H., Wang, G.H., Chan, L., Lo, G.-Q., Samudra, G., Yeo, Y.-C. (2006-12). I-MOS transistor with an elevated silicon-germanium impact-ionization region for bandgap engineering. IEEE Electron Device Letters 27 (12) : 975-977. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2006.886708 | |
dc.identifier.issn | 07413106 | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/82494 | |
dc.description.abstract | An impact-ionization MOS (I-MOS) transistor with an elevated impact-ionization region (I-region) and excellent subthreshold swing of 3.2 mV/dec at room temperature is demonstrated. An elevated Si 0.75Ge0.25 region is integrated and employed to engineer the bandgap and impact-ionization rate in the I-region. Compared to a device with a Si I-region, an I-MOS device with a Si0.75Ge0.25 I-region shows significantly enhanced performance due to the smaller bandgap of the I-region and the enhanced impact-ionization rate. For the I-MOS device with a Si0.75 Ge0.25 I-region, the breakdown voltage is also reduced, and a significant drive current enhancement is achieved at VG-VT=1 V and a gate length of 80 nm. © 2006 IEEE. | |
dc.description.uri | http://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1109/LED.2006.886708 | |
dc.source | Scopus | |
dc.subject | Impact ionization | |
dc.subject | Impact-ionization MOS (I-MOS) | |
dc.subject | Silicon-germanium | |
dc.subject | Subthreshold swing | |
dc.type | Article | |
dc.contributor.department | ELECTRICAL & COMPUTER ENGINEERING | |
dc.description.doi | 10.1109/LED.2006.886708 | |
dc.description.sourcetitle | IEEE Electron Device Letters | |
dc.description.volume | 27 | |
dc.description.issue | 12 | |
dc.description.page | 975-977 | |
dc.description.coden | EDLED | |
dc.identifier.isiut | 000242606000010 | |
Appears in Collections: | Staff Publications |
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