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https://doi.org/10.1063/1.3526735
DC Field | Value | |
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dc.title | Enhancement of perpendicular exchange bias in [Pd/Co]/FeMn thin films by tailoring the magnetoelastically induced perpendicular anisotropy | |
dc.contributor.author | Lin, L. | |
dc.contributor.author | Thiyagarajah, N. | |
dc.contributor.author | Joo, H.W. | |
dc.contributor.author | Heo, J. | |
dc.contributor.author | Lee, K.A. | |
dc.contributor.author | Bae, S. | |
dc.date.accessioned | 2014-10-07T04:27:40Z | |
dc.date.available | 2014-10-07T04:27:40Z | |
dc.date.issued | 2010-12-13 | |
dc.identifier.citation | Lin, L., Thiyagarajah, N., Joo, H.W., Heo, J., Lee, K.A., Bae, S. (2010-12-13). Enhancement of perpendicular exchange bias in [Pd/Co]/FeMn thin films by tailoring the magnetoelastically induced perpendicular anisotropy. Applied Physics Letters 97 (24) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3526735 | |
dc.identifier.issn | 00036951 | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/82293 | |
dc.description.abstract | The effects of magnetoelastically induced perpendicular anisotropy, K FM,me, on the perpendicular exchange bias (PEB) characteristics in [Pd/Co]5/Fe50Mn50 thin films have been explored by inserting ultrathin CoFe magnetic layers with different thicknesses, compositions, and Ar sputtering gas pressures (PAr,CoFe) at the interface between [Pd/Co]5 and FeMn. It was clearly found that the [Pd/Co]5 /CoFe/FeMn with CoFe sputtered at a low PAr,CoFe showed great enhancement in PEB due to the development of intrinsic compressive stress in the CoFe resulting in improving KFM,me and interfacial exchange coupling. Additionally, this effect was more significant for Co 80Fe20 insertion than Co90Fe10 due to its larger magnetostriction. © 2010 American Institute of Physics. | |
dc.description.uri | http://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1063/1.3526735 | |
dc.source | Scopus | |
dc.type | Article | |
dc.contributor.department | ELECTRICAL & COMPUTER ENGINEERING | |
dc.description.doi | 10.1063/1.3526735 | |
dc.description.sourcetitle | Applied Physics Letters | |
dc.description.volume | 97 | |
dc.description.issue | 24 | |
dc.description.page | - | |
dc.description.coden | APPLA | |
dc.identifier.isiut | 000285481000052 | |
Appears in Collections: | Staff Publications |
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