Please use this identifier to cite or link to this item:
https://doi.org/10.1109/TED.2006.888669
DC Field | Value | |
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dc.title | A comparative study of HfTaON/SiO2 and HfON/SiO2 gate stacks with TaN metal gate for advanced CMOS applications | |
dc.contributor.author | Yu, X. | |
dc.contributor.author | Yu, M. | |
dc.contributor.author | Zhu, C. | |
dc.date.accessioned | 2014-10-07T04:22:23Z | |
dc.date.available | 2014-10-07T04:22:23Z | |
dc.date.issued | 2007-02 | |
dc.identifier.citation | Yu, X., Yu, M., Zhu, C. (2007-02). A comparative study of HfTaON/SiO2 and HfON/SiO2 gate stacks with TaN metal gate for advanced CMOS applications. IEEE Transactions on Electron Devices 54 (2) : 284-290. ScholarBank@NUS Repository. https://doi.org/10.1109/TED.2006.888669 | |
dc.identifier.issn | 00189383 | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/81846 | |
dc.description.abstract | The electrical characteristics of a novel HfTaON/SiO2 gate stack, which consists of a HfTaON film with a dielectric constant of 23 and a 10-Å SiO2 interfacial layer, have been investigated for advanced CMOS applications. The HfTaON/SiO2 gate stack provided much lower gate leakage current against SiO2, good interface properties, excellent transistor characteristics, and superior carrier mobility. Compared to HfON/SiO2, improved thermal stability was also observed in the HfTaON/SiO2 gate stack. Moreover, charge-trapping-induced threshold voltage Vth instability was examined for the HfTaON/ SiO2 and HfON/SiO2 gate stacks. The HfTaON/SiO2 gate stack exhibited significant suppression of the Vth instability compared to the HfON/SiO2, in particular, for nMOSFETs. The excellent performances observed in the HfTaON/SiO2 gate stack indicate that it has the potential to replace conventional SiO2 or SiON as gate dielectric for advanced CMOS applications.© 2007 IEEE. | |
dc.description.uri | http://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1109/TED.2006.888669 | |
dc.source | Scopus | |
dc.subject | Charge trapping | |
dc.subject | Gate leakage current | |
dc.subject | High-Κ gate dielectric | |
dc.subject | Interface-state density Dit | |
dc.subject | Metal gate | |
dc.subject | Mobility | |
dc.subject | MOSFETs | |
dc.subject | Thermal stability | |
dc.subject | Vth instability | |
dc.type | Article | |
dc.contributor.department | ELECTRICAL & COMPUTER ENGINEERING | |
dc.description.doi | 10.1109/TED.2006.888669 | |
dc.description.sourcetitle | IEEE Transactions on Electron Devices | |
dc.description.volume | 54 | |
dc.description.issue | 2 | |
dc.description.page | 284-290 | |
dc.description.coden | IETDA | |
dc.identifier.isiut | 000243888100015 | |
Appears in Collections: | Staff Publications |
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