Please use this identifier to cite or link to this item: https://doi.org/10.1117/12.431213
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dc.titleA new mechanism of laser dry cleaning
dc.contributor.authorLuk'yanchuk, B.S.
dc.contributor.authorZheng, Y.W.
dc.contributor.authorLu, Y.F.
dc.date.accessioned2014-10-07T03:07:37Z
dc.date.available2014-10-07T03:07:37Z
dc.date.issued2000
dc.identifier.citationLuk'yanchuk, B.S., Zheng, Y.W., Lu, Y.F. (2000). A new mechanism of laser dry cleaning. Proceedings of SPIE - The International Society for Optical Engineering 4423 : 115-126. ScholarBank@NUS Repository. https://doi.org/10.1117/12.431213
dc.identifier.issn0277786X
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/81373
dc.description.abstractThe dry laser cleaning arises due to thermal expansion of the substrate and/or particle, when the corresponding acceleration (breaking) force produces work sufficient to overcome the adhesion energy. The previous examinations of the dry cleaning were done for two mechanisms: 1) expansion of absorbing particle on the transparent substrate and 2) expansion (thermal deformation) of the absorbing substrate with non-absorbing particle. Nevertheless using model with conventional mechanism based on the 1D surface expansion, one can find (for the smooth laser pulse) threshold fluence by the order of magnitude higher than experimental one. In the present paper, we discuss the new mechanism for situation when the particle is heated due to thermal contact with substrate, and additional thermodeformation effect, caused by optical enhancement. It is shown that these effects can be responsible for relatively small threshold fluence for laser cleaning of SiO2 particles (with size 0.5-1.0 μm) from the surface of Si by ns-excimer laser pulse.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1117/12.431213
dc.sourceScopus
dc.subjectDry cleaning
dc.subjectLaser cleaning
dc.subjectModelling
dc.typeConference Paper
dc.contributor.departmentELECTRICAL ENGINEERING
dc.description.doi10.1117/12.431213
dc.description.sourcetitleProceedings of SPIE - The International Society for Optical Engineering
dc.description.volume4423
dc.description.page115-126
dc.description.codenPSISD
dc.identifier.isiut000172549100020
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