Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/81064
DC FieldValue
dc.titleRecombination lifetime in silicon from laser microwave photoconductance decay measurement
dc.contributor.authorLing, C.H.
dc.contributor.authorTeoh, H.K.
dc.contributor.authorChoi, W.K.
dc.contributor.authorZhou, T.Q.
dc.contributor.authorAh, L.K.
dc.date.accessioned2014-10-07T03:04:16Z
dc.date.available2014-10-07T03:04:16Z
dc.date.issued1995
dc.identifier.citationLing, C.H.,Teoh, H.K.,Choi, W.K.,Zhou, T.Q.,Ah, L.K. (1995). Recombination lifetime in silicon from laser microwave photoconductance decay measurement. Materials Science Forum 173-174 : 255-258. ScholarBank@NUS Repository.
dc.identifier.issn02555476
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/81064
dc.description.abstractThe effective minority carrier recombination lifetime in oxidized silicon wafers is measured using a laser microwave photoconductance technique. The effect of surface recombination is demonstrated through altering the silicon band bending at the oxide/silicon interface, through a non-contact injection of charges on the outer oxide surface by a corona discharge. The dependence of effective lifetime on wafer orientation and oxidation conditions is investigated.
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentELECTRICAL ENGINEERING
dc.description.sourcetitleMaterials Science Forum
dc.description.volume173-174
dc.description.page255-258
dc.description.codenMSFOE
dc.identifier.isiutNOT_IN_WOS
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