Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/81031
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dc.titleQuantitative detection of oxygen contamination related traps in gallium arsenide epitaxial layer grown by molecular beam epitaxy at low temperature
dc.contributor.authorLau, Wai Shing
dc.contributor.authorGoo, Chuen Hang
dc.contributor.authorChong, Tow Chong
dc.contributor.authorChu, Paul K.
dc.date.accessioned2014-10-07T03:03:55Z
dc.date.available2014-10-07T03:03:55Z
dc.date.issued1993-09-01
dc.identifier.citationLau, Wai Shing,Goo, Chuen Hang,Chong, Tow Chong,Chu, Paul K. (1993-09-01). Quantitative detection of oxygen contamination related traps in gallium arsenide epitaxial layer grown by molecular beam epitaxy at low temperature. Japanese Journal of Applied Physics, Part 2: Letters 32 (9 A) : L1192-L1195. ScholarBank@NUS Repository.
dc.identifier.issn00214922
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/81031
dc.description.abstractUsing a new technique, zero quiescent bias voltage transient current spectroscopy (ZBTCS), a semi-insulating GaAs epitaxial layer grown by MBE at 230 °C is found to have a continuum of states with some discrete traps. The dominant discrete electron trap has an activation energy of 0.55 eV and a concentration of the order of 1017 cm-3. This trap is believed to be the EL3 electron trap related to oxygen contamination. Quantitative secondary ion mass spectroscopy (SIMS) measurements confirms that GaAs epitaxial layers tend to be contaminated by oxygen when the growth temperature is low. The role of an ammonium sulphide surface treatment on the measured trap concentration is also discussed.
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentELECTRICAL ENGINEERING
dc.description.sourcetitleJapanese Journal of Applied Physics, Part 2: Letters
dc.description.volume32
dc.description.issue9 A
dc.description.pageL1192-L1195
dc.description.codenJAPLD
dc.identifier.isiutNOT_IN_WOS
Appears in Collections:Staff Publications

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