Please use this identifier to cite or link to this item:
https://scholarbank.nus.edu.sg/handle/10635/80621
DC Field | Value | |
---|---|---|
dc.title | Interfacial polarization in Al-Y2O3-SiO2-Si capacitor | |
dc.contributor.author | Ling, C.H. | |
dc.date.accessioned | 2014-10-07T02:59:31Z | |
dc.date.available | 2014-10-07T02:59:31Z | |
dc.date.issued | 1993-01-01 | |
dc.identifier.citation | Ling, C.H. (1993-01-01). Interfacial polarization in Al-Y2O3-SiO2-Si capacitor. Electronics Letters 29 (19) : 1676-1678. ScholarBank@NUS Repository. | |
dc.identifier.issn | 00135194 | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/80621 | |
dc.description.abstract | The variation by a factor of 2 in the observed permittivity of yttrium oxide film is explained in terms of interfacial polarization based on the Y2O3/SiO2 double-layer model. Provided the dielectric relaxation time constants of the two layers are grossly dissimilar, the model can also explain the frequency independence of the composite capacitor. | |
dc.source | Scopus | |
dc.type | Article | |
dc.contributor.department | ELECTRICAL ENGINEERING | |
dc.description.sourcetitle | Electronics Letters | |
dc.description.volume | 29 | |
dc.description.issue | 19 | |
dc.description.page | 1676-1678 | |
dc.description.coden | ELLEA | |
dc.identifier.isiut | NOT_IN_WOS | |
Appears in Collections: | Staff Publications |
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