Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/80393
DC FieldValue
dc.titleElectron trapping and interface state generation in PMOSFET's: Results from gate capacitance
dc.contributor.authorLing, C.H.
dc.date.accessioned2014-10-07T02:57:02Z
dc.date.available2014-10-07T02:57:02Z
dc.date.issued1993-10-01
dc.identifier.citationLing, C.H. (1993-10-01). Electron trapping and interface state generation in PMOSFET's: Results from gate capacitance. Japanese Journal of Applied Physics, Part 2: Letters 32 (10 A) : L1371-L1373. ScholarBank@NUS Repository.
dc.identifier.issn00214922
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/80393
dc.description.abstractSignificant generation of hot-carrier induced donor and acceptor interface states in PMOSFET's is observed for the first time from gate-to-drain capacitance Cgd* s. Plotting the change ΔCgd* s against gate bias reveals two peaks, attributed to donor and acceptor states. A voltage on the drain displaces the donor peak by approximately the amount of the applied voltage, but the acceptor peak shifts by a fixed amount.
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentELECTRICAL ENGINEERING
dc.description.sourcetitleJapanese Journal of Applied Physics, Part 2: Letters
dc.description.volume32
dc.description.issue10 A
dc.description.pageL1371-L1373
dc.description.codenJAPLD
dc.identifier.isiutNOT_IN_WOS
Appears in Collections:Staff Publications

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