Please use this identifier to cite or link to this item:
https://scholarbank.nus.edu.sg/handle/10635/80393
DC Field | Value | |
---|---|---|
dc.title | Electron trapping and interface state generation in PMOSFET's: Results from gate capacitance | |
dc.contributor.author | Ling, C.H. | |
dc.date.accessioned | 2014-10-07T02:57:02Z | |
dc.date.available | 2014-10-07T02:57:02Z | |
dc.date.issued | 1993-10-01 | |
dc.identifier.citation | Ling, C.H. (1993-10-01). Electron trapping and interface state generation in PMOSFET's: Results from gate capacitance. Japanese Journal of Applied Physics, Part 2: Letters 32 (10 A) : L1371-L1373. ScholarBank@NUS Repository. | |
dc.identifier.issn | 00214922 | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/80393 | |
dc.description.abstract | Significant generation of hot-carrier induced donor and acceptor interface states in PMOSFET's is observed for the first time from gate-to-drain capacitance Cgd* s. Plotting the change ΔCgd* s against gate bias reveals two peaks, attributed to donor and acceptor states. A voltage on the drain displaces the donor peak by approximately the amount of the applied voltage, but the acceptor peak shifts by a fixed amount. | |
dc.source | Scopus | |
dc.type | Article | |
dc.contributor.department | ELECTRICAL ENGINEERING | |
dc.description.sourcetitle | Japanese Journal of Applied Physics, Part 2: Letters | |
dc.description.volume | 32 | |
dc.description.issue | 10 A | |
dc.description.page | L1371-L1373 | |
dc.description.coden | JAPLD | |
dc.identifier.isiut | NOT_IN_WOS | |
Appears in Collections: | Staff Publications |
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