Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/80367
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dc.titleEffect of micro-extraction field and physical dimensions on the charging dynamics of integrated circuit passivation layer probe-holes in the electron beam tester
dc.contributor.authorSim, K.S.
dc.contributor.authorPhang, J.C.H.
dc.contributor.authorChan, D.S.H.
dc.date.accessioned2014-10-07T02:56:45Z
dc.date.available2014-10-07T02:56:45Z
dc.date.issued1995-11
dc.identifier.citationSim, K.S.,Phang, J.C.H.,Chan, D.S.H. (1995-11). Effect of micro-extraction field and physical dimensions on the charging dynamics of integrated circuit passivation layer probe-holes in the electron beam tester. Microelectronic Engineering 26 (3-4) : 155-166. ScholarBank@NUS Repository.
dc.identifier.issn01679317
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/80367
dc.description.abstractThis paper presents numerical simulation results which show that the side-wall of a 1 μm deep probe-hole in the SiO2 passivation layer of an integrated circuit charges up severely when a 1 keV beam is probing a test point inside the probe hole. The rate of side-wall charging and the polarity of charge depend on the width of the probe-hole and the strength of the extraction field inside the probe-hole. The side-wall charges up positively when the extraction field inside the probe hole is equal to or greater than 20 V/μm and the width of the probe-hole equal to or greater than 1 μm. The side-wall charges up negatively under all other conditions. © 1995.
dc.sourceScopus
dc.typeArticle
dc.contributor.departmentELECTRICAL ENGINEERING
dc.contributor.departmentINSTITUTE OF MICROELECTRONICS
dc.description.sourcetitleMicroelectronic Engineering
dc.description.volume26
dc.description.issue3-4
dc.description.page155-166
dc.description.codenMIENE
dc.identifier.isiutNOT_IN_WOS
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