Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/80342
DC FieldValue
dc.titleCorrelation between charge pumping method and direct-current current voltage method in p-type metal-oxide-semiconductor field-effect transistors
dc.contributor.authorJie, B.-B.
dc.contributor.authorNg, K.-H.
dc.contributor.authorLi, M.-F.
dc.contributor.authorLo, K.-F.
dc.date.accessioned2014-10-07T02:56:28Z
dc.date.available2014-10-07T02:56:28Z
dc.date.issued1999-08-15
dc.identifier.citationJie, B.-B.,Ng, K.-H.,Li, M.-F.,Lo, K.-F. (1999-08-15). Correlation between charge pumping method and direct-current current voltage method in p-type metal-oxide-semiconductor field-effect transistors. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 38 (8 B) : 4696-4698. ScholarBank@NUS Repository.
dc.identifier.issn00214922
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/80342
dc.description.abstractIn this study, the correlation between the charge pumping (CP) method and the direct-current current voltage (DCIV) method in p-type metal-oxide-semiconductor field-effect transistors (pMOSFETs) is investigated. We found that the two techniques probe essentially the same interface traps in the channel (C) region as well as in the drain (D) region. A good linear relationship is observed between the DCIV signal and the CP signal. One obvious advantage of the DCIV methòd is that it can clearly and directly distinguish the interface traps in the C region and in the D region, respectively. This is possible in the CP method only after complicated manipulation of raw experimental data. The shift of Vcp shows the net effect of compensating oxide charge and interface trapped charge, while the shift of Vgb.max mainly shows the effect of the oxide charge. © 1999 Publication Board, Japanese Journal of Applied Physics.
dc.sourceScopus
dc.subjectCharge pumping
dc.subjectDCIV
dc.subjectInterface trap
dc.subjectOxide charge
dc.subjectpMOSFET
dc.typeArticle
dc.contributor.departmentELECTRICAL ENGINEERING
dc.description.sourcetitleJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
dc.description.volume38
dc.description.issue8 B
dc.description.page4696-4698
dc.description.codenJAPLD
dc.identifier.isiutNOT_IN_WOS
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