Please use this identifier to cite or link to this item:
https://scholarbank.nus.edu.sg/handle/10635/76054
DC Field | Value | |
---|---|---|
dc.title | Electrochemistry of chromium deposition from thiocyanato trivalent system | |
dc.contributor.author | Hsieh, A.K. | |
dc.contributor.author | Ee, Y.H. | |
dc.contributor.author | Chen, K.N. | |
dc.date.accessioned | 2014-06-23T05:38:01Z | |
dc.date.available | 2014-06-23T05:38:01Z | |
dc.date.issued | 1993-04 | |
dc.identifier.citation | Hsieh, A.K.,Ee, Y.H.,Chen, K.N. (1993-04). Electrochemistry of chromium deposition from thiocyanato trivalent system. Metal Finishing 91 (4) : 53-57. ScholarBank@NUS Repository. | |
dc.identifier.issn | 00260576 | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/76054 | |
dc.description.abstract | Cyclic voltammetry and DC polarography are used to investigate a trivalent chromium electrolyte and a stepwise reaction mechanism is proposed. The system of Cr(III)-NCS is studied theoretically and the results are used as a guide to the actual electroplating operation. | |
dc.source | Scopus | |
dc.type | Article | |
dc.contributor.department | CHEMISTRY | |
dc.description.sourcetitle | Metal Finishing | |
dc.description.volume | 91 | |
dc.description.issue | 4 | |
dc.description.page | 53-57 | |
dc.description.coden | MEFIA | |
dc.identifier.isiut | NOT_IN_WOS | |
Appears in Collections: | Staff Publications |
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