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Please use this identifier to cite or link to this item: https://doi.org/10.1117/12.607331
DC FieldValue
dc.titleMesoporous silica thin films prepared by argon plasma treatment of sol-gel-derived precursor
dc.contributor.authorZhang, J.
dc.contributor.authorPalaniappan, A.
dc.contributor.authorSu, X.
dc.contributor.authorTay, F.E.H.
dc.date.accessioned2014-06-19T05:37:09Z
dc.date.available2014-06-19T05:37:09Z
dc.date.issued2005
dc.identifier.citationZhang, J., Palaniappan, A., Su, X., Tay, F.E.H. (2005). Mesoporous silica thin films prepared by argon plasma treatment of sol-gel-derived precursor. Proceedings of SPIE - The International Society for Optical Engineering 5774 : 291-295. ScholarBank@NUS Repository. https://doi.org/10.1117/12.607331
dc.identifier.issn0277786X
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/73605
dc.description.abstractArgon plasma is used to generate the mesoporous silica thin films from sol-gel-derived precursor. Poly(ethylene glycol)(PEG, MW=400) is employed as the template, i.e., the pore directing-agent as well as the binder. The influence of the plasma parameters on the mesoscopic properties of silica films are investigated by scanning electron microscopy (SEM), FT-IR, low-angle X-ray scattering (SAXS), and nitrogen isotherm adsorption.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1117/12.607331
dc.sourceScopus
dc.subjectArgon plasma
dc.subjectMesoporous
dc.subjectPEG template
dc.subjectSilica
dc.subjectSol-gel
dc.typeConference Paper
dc.contributor.departmentMECHANICAL ENGINEERING
dc.description.doi10.1117/12.607331
dc.description.sourcetitleProceedings of SPIE - The International Society for Optical Engineering
dc.description.volume5774
dc.description.page291-295
dc.description.codenPSISD
dc.identifier.isiut000226292200067
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