1. ScholarBank@NUS
  2. 1. Staff
  3. Staff Publications
Please use this identifier to cite or link to this item: https://doi.org/10.1109/20.908917
DC FieldValue
dc.titleStudy of in-depth defects using Magneto-optical Kerr Effect by measuring the magnetic hardness coefficient in magnetic thin films
dc.contributor.authorLeong, S.H.
dc.contributor.authorWang, J.P.
dc.contributor.authorLow, T.S.
dc.date.accessioned2014-06-19T05:13:47Z
dc.date.available2014-06-19T05:13:47Z
dc.date.issued2000-09
dc.identifier.citationLeong, S.H.,Wang, J.P.,Low, T.S. (2000-09). Study of in-depth defects using Magneto-optical Kerr Effect by measuring the magnetic hardness coefficient in magnetic thin films. IEEE Transactions on Magnetics 36 (5 I) : 3611-3613. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/20.908917" target="_blank">https://doi.org/10.1109/20.908917</a>
dc.identifier.issn00189464
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/72946
dc.description.abstractA Magneto-optical Kerr Effect (MOKE) system was built and used for acquiring saturation magnetization curves and measuring the magnetic hardness coefficient, a of magnetic thin film samples. Co thin films were sputtered on glass substrate under various sputtering conditions. The magnetic hardness coefficient was measured using the MOKE setup. Results for a (Oe) were further correlated using transmission electron microscopy (TEM) and X-ray diffraction (XRD) analysis. It was found that a (Oe), a useful indicator for in-depth defects in Co films, increased with both working and base pressure but decreased with higher deposition temperatures. This trend is in agreement with well-known microstructure control techniques by changing sputtering parameters.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1109/20.908917
dc.sourceScopus
dc.subjectIn-depth defects
dc.subjectMagnetic hardness coefficient
dc.subjectMagneto-optical Kerr effect
dc.subjectSaturation magnetization curve
dc.typeConference Paper
dc.contributor.departmentELECTRICAL ENGINEERING
dc.description.doi10.1109/20.908917
dc.description.sourcetitleIEEE Transactions on Magnetics
dc.description.volume36
dc.description.issue5 I
dc.description.page3611-3613
dc.description.codenIEMGA
dc.identifier.isiutNOT_IN_WOS
Appears in Collections:Staff Publications

Show simple item record
Files in This Item:
There are no files associated with this item.

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.