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Please use this identifier to cite or link to this item: https://doi.org/10.1109/ICIMW.2010.5612488
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dc.titleTerahertz wire-grid polarizer by nanoimprinting lithography on high resistivity silicon substrate
dc.contributor.authorZhang, L.
dc.contributor.authorTeng, J.H.
dc.contributor.authorTanoto, H.
dc.contributor.authorYew, Y.
dc.contributor.authorDeng, L.Y.
dc.contributor.authorChua, S.J.
dc.date.accessioned2014-06-19T03:29:48Z
dc.date.available2014-06-19T03:29:48Z
dc.date.issued2010
dc.identifier.citationZhang, L.,Teng, J.H.,Tanoto, H.,Yew, Y.,Deng, L.Y.,Chua, S.J. (2010). Terahertz wire-grid polarizer by nanoimprinting lithography on high resistivity silicon substrate. IRMMW-THz 2010 - 35th International Conference on Infrared, Millimeter, and Terahertz Waves, Conference Guide : -. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/ICIMW.2010.5612488" target="_blank">https://doi.org/10.1109/ICIMW.2010.5612488</a>
dc.identifier.isbn9781424466573
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/71957
dc.description.abstractTerahertz wire-grid polarizer with 500nm grating period on high resistivity silicon (100) is fabricated using nanoimprinting lithography (NIL). Preliminary results show a good polarization characteristic ranging from 0.5 to 5 THz. The method is high throughput and low cost. © 2010 IEEE.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1109/ICIMW.2010.5612488
dc.sourceScopus
dc.typeConference Paper
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.doi10.1109/ICIMW.2010.5612488
dc.description.sourcetitleIRMMW-THz 2010 - 35th International Conference on Infrared, Millimeter, and Terahertz Waves, Conference Guide
dc.description.page-
dc.identifier.isiutNOT_IN_WOS
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